Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Jean-Christophe Imbert"'
Autor:
Michel Touzeau, J. Bretagne, Jean-Christophe Imbert, P. Pitach, Lionel Teulé-Gay, M. C. Hugon, C. Boisse-Laporte, D Pagnon, L. de Poucques
Publikováno v:
Thin Solid Films. 516:4700-4708
The Ionized Physical Vapour Deposition technique has been developed since 1990 as an improvement of the magnetron sputtering technique to obtain more conformal and dense deposited layers. Amongst the different methods developed to ensure the ionizati
Autor:
Marcel Meško, Jean-Christophe Imbert, D Pagnon, L. de Poucques, Michel Touzeau, Mihai Ganciu, J. Bretagne, Caroline Boisse-Laporte, Petr Vašina
Publikováno v:
Plasma Sources Science and Technology. 16:501-510
This paper is focused on experimental studies of a high power pulsed magnetron discharge stabilized by low current pre-ionization. Time resolved studies were performed for a Cu target by optical emission spectroscopy and electrical measurements for d
Autor:
Ludovic de Poucques, J. Bretagne, Jean-Christophe Imbert, Mihai Ganciu, Lionel Teulé-Gay, Petr Vašina, Michel Touzeau, Carolline Boisse-Laporte
Publikováno v:
Plasma Processes and Polymers. 4:S424-S429
The paper study transport of ionized sputtered particles by means of time and space resolved optical absorption spectroscopy - we concluded that the transport is govern maainly by ambipolar difussion.
Autor:
Lionel Teulé-Gay, Petr Vašina, J. Bretagne, Jean-Christophe Imbert, Michel Touzeau, Caroline Boisse-Laporte, L. de Poucques
Publikováno v:
Surface and Coatings Technology. 200:800-803
While most of Ionised Physical Vapour Deposition (IPVD) reactors use radio-frequency coils to create additional ionisation, we developed an alternative technique using two microwave antennas to achieve the ionisation of the sputtered vapour. The aim
Autor:
Caroline Boisse-Laporte, M.C. Hugon, J. Bretagne, Dmitry V. Shtansky, O. Voldoire, L. de Poucques, Jean-Christophe Imbert, Lionel Teulé-Gay, Michel Touzeau
Publikováno v:
Surface and Coatings Technology. 200:717-720
Classical magnetron sputtering assisted with an additional ionization device, especially a radio-frequency coil, is a well-known technique to improve the deposited layer qualities. The aim of this work is to characterize the deposition of titanium ba
Autor:
Michel Touzeau, Ludovic de Poucques, Caroline Boisse-Laporte, Jean-Christophe Imbert, Petr Vašina, J. Bretagne, Lionel Teulé-Gay
Publikováno v:
Plasma Sources Science and Technology. 14:321-328
This paper deals with the characterization of an ionized physical vapour deposition (IPVD) reactor using an additional microwave plasma. The IPVD reactor was spatially characterized using optical emission spectroscopy, optical absorption spectroscopy
Autor:
O. Leroy, G. Gousset, C. Boisse-Laporte, M. C. Hugon, Lionel Teulé-Gay, Petr Vašina, O. Voldoire, J. Bretagne, Michel Touzeau, Jean-Christophe Imbert, L. de Poucques
Publikováno v:
Nanostructured Thin Films and Nanodispersion Strengthened Coatings ISBN: 9781402022203
While most of the IPVD reactors use radio-frequency (RF) coils to create additional ionization, we developed an alternative technique consisting of a home made magnetron sputtering device in which the ionization of the emitted sputtered vapor is achi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3500466cd14937d0491bafa415576f53
https://doi.org/10.1007/1-4020-2222-0_11
https://doi.org/10.1007/1-4020-2222-0_11