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Autor:
Young-Joon Baik, Jong-Wan Park, Kwang Yong Eun, Jae-Kap Lee, Hui Jun Cheon, Jea Weon Rhyu, Taek Jung Shin
Publikováno v:
Diamond and Related Materials. 11:463-466
Recently, considerable progress in direct current plasma assisted chemical vapor deposition (DC PACVD) of diamond materials has been achieved by adopting a multi-cathode system with cathode temperatures maintained above 2000 °C. This paper presents
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fcc41dd31f1443fc22c243918a5d7b89
https://doi.org/10.1016/s0925-9635(01)00625-2
https://doi.org/10.1016/s0925-9635(01)00625-2
