Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jay Chih-Chieh Chen"'
Autor:
Shu-Ping Fang, Ted Dziura, Steven Fu, Benjamin Szu-Min Lin, Chih-Chung Huang, Regina Freed, Bo-Jau Tsau, Mike Yeh, Mike D. Slessor, Jay Chih-Chieh Chen
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
A small notch or foot existing at the bottom of a polysilicon gate is a common issue for etching processes. The small notch or foot could have a major impact on the length of the polysilicon gate, and the performance of the device would then be impac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7e992ad2e0dcebbe74dd18622847a4e
https://doi.org/10.1117/12.536269
https://doi.org/10.1117/12.536269
Publikováno v:
Process and Materials Characterization and Diagnostics in IC Manufacturing.
Faster time to results is becoming more and more critical for chip makers to build up the production monitoring capability on advanced process development. Especially for SiGe's process, which uses SEG process by adding germanium. SiGe products provi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d7e4bdfed253bbdcfb6e0bf43db02ea
https://doi.org/10.1117/12.485236
https://doi.org/10.1117/12.485236