Zobrazeno 1 - 10
of 159
pro vyhledávání: '"Jay A. Switzer"'
Publikováno v:
ACS Applied Materials & Interfaces. 15:18440-18449
Autor:
Jay A. Switzer, Avishek Banik
Publikováno v:
Accounts of Chemical Research.
Publikováno v:
Chemistry of Materials. 33:3220-3227
The expansion of future optoelectronic materials into transparent flexible electronics, perovskite, organic, and tandem photovoltaics depends on the development of high-performance p-type materials...
Publikováno v:
Chemistry of Materials. 32:8367-8372
Highly ordered, epitaxial semiconductor thin films have low defect densities and excellent photophysical properties that are desired for optoelectronic devices. In this work, the epitaxial films of...
Publikováno v:
The Journal of Physical Chemistry C. 124:21426-21434
Functional self-assembled monolayers (SAMs) of thiols on single-crystal metals provide two-dimensional (2D) soft templates for the highly ordered growth of crystalline materials. An epitaxial Cu(11...
Publikováno v:
Science. 364:166-169
Epitaxial films through spin coating A simple way to coat a surface with a uniform film is by spin coating. The substrate is spun at high speed, and a droplet of solution containing the coating is added at the center, spreads out, and evaporates. Thi
Autor:
Qingzhi Chen, Jay A. Switzer
Publikováno v:
Journal of Materials Chemistry C. 7:1720-1725
Silver films were deposited epitaxially for the first time onto low-index, single-crystal silicon wafers through an electrochemical method in an aqueous silver acetate bath. A negative potential of −2.34 V vs. Hg/Hg2SO4 was used for both pre-polari
Publikováno v:
Journal of The Electrochemical Society. 169:092512
Cuprous halides are an important class of wide bandgap p-type semiconductors used in opto-electronics. Cuprous bromide (CuBr) shows potential for short-wavelength devices due to a large exciton binding energy (108 meV) and near-ultraviolet bandgap (3
Autor:
Caleb M. Hull, Jay A. Switzer
Publikováno v:
ACS Applied Materials & Interfaces. 10:38596-38602
A two-step potential electrodeposition technique is described which gives epitaxial films of Cu(100) on n-Si(100). Nucleation of epitaxial seeds occurs at -1.5 VAg/AgCl, whereas the film is grown at -0.5 VAg/AgCl. Cu deposition occurs with a Faradaic
Autor:
Avishek Banik, Jay A. Switzer
Publikováno v:
ECS Meeting Abstracts. :634-634