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Autor:
Kangsan Lee, David Tien, MinGyu Kim, Bill Pierson, Dongsub Choi, JawWuk Ju, Mark D. Smith, Ady Levy, John C. Robinson, Sanghuck Jeon, Stuart Sherwin, Dohwa Lee, JuHan Lee, George Hoo
Publikováno v:
SPIE Proceedings.
Feedback control of overlay errors to the scanner is a well-established technique in semiconductor manufacturing [1]. Typically, overlay errors are measured, and then modeled by least-squares fitting to an overlay model. Overlay models are typically
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f234c692b26c44b0fc3ad25074f8eb5c
https://doi.org/10.1117/12.2085074
https://doi.org/10.1117/12.2085074
