Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Javier Arias‐Zapata"'
Autor:
Tadeáš Hanuš, Javier Arias‐Zapata, Bouraoui Ilahi, Philippe‐Olivier Provost, Jinyoun Cho, Kristof Dessein, Abderraouf Boucherif
Publikováno v:
Advanced Materials Interfaces, Vol 10, Iss 14, Pp n/a-n/a (2023)
Abstract Porous germanium (PGe) nanostructures attract a lot of attention for various emerging applications due to their unique properties. Consequently, there is an increasing need for the development of low‐cost synthesis routes that are compatib
Externí odkaz:
https://doaj.org/article/67bc1bbf4ccf4823a67e1c1b96114677
Autor:
Sophie Böhme, Javier Arias-Zapata, Jérôme Garnier, Cécile Girardot, Antoine Legrain, Marc Zelsmann
Publikováno v:
Micro and Nano Engineering, Vol 1, Iss , Pp 56-62 (2018)
Ultra high resolution lithography (sub-15 nm) could be developed using the directed self-assembly of block copolymers (BCPs), for which a high incompatibility – i.e. high-χ – between the blocks is necessary. Here we present an industrial compati
Externí odkaz:
https://doaj.org/article/6ca8380eb8f342e9a483b9d69090adcf
Autor:
Tadeas Hanus, Javier Arias-Zapata, Bouraoui Ilahi, Philippe-Olivier Provost, Alexandre Chapotot, Abderraouf Boucherif
Publikováno v:
2022 IEEE 49th Photovoltaics Specialists Conference (PVSC).
Autor:
Alexandre Chapotot, Javier Arias-Zapata, Tadeas Hanus, Bouraoui Ilahi, Nicolas Paupy, Valentin Daniel, Zakaria Oulad El Hmaidi, Jeremie Chretien, Gwenaelle Hamon, Maxime Darnon, Abderraouf Boucherif
Publikováno v:
2022 IEEE 49th Photovoltaics Specialists Conference (PVSC).
Autor:
Abdelouadoud El Mesoudy, Gwénaëlle Lamri, Raphaël Dawant, Javier Arias-Zapata, Pierre Gliech, Yann Beilliard, Serge Ecoffey, Andreas Ruediger, Fabien Alibart, Dominique Drouin
Publikováno v:
Microelectronic Engineering
Microelectronic Engineering, 2022, 255, pp.111706. ⟨10.1016/j.mee.2021.111706⟩
Microelectronic Engineering, 2022, 255, pp.111706. ⟨10.1016/j.mee.2021.111706⟩
Brain-inspired computing and neuromorphic hardware are promising approaches that offer great potential to overcome limitations faced by current computing paradigms based on traditional von-Neumann architecture. In this regard, interest in developing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7bc11589a866702180f9f6e4e2adc5e3
http://arxiv.org/abs/2106.11808
http://arxiv.org/abs/2106.11808
Autor:
Javier Arias-Zapata, Marc Zelsmann, Antoine Legrain, Hasan-al Mehedi, Bassem Salem, Gilles Cunge, Jérôme Garnier
Publikováno v:
Chemistry of Materials
Chemistry of Materials, 2019, 31 (9), pp.3154-3162. ⟨10.1021/acs.chemmater.8b04936⟩
Chemistry of Materials, American Chemical Society, 2019, 31 (9), pp.3154-3162. ⟨10.1021/acs.chemmater.8b04936⟩
Chemistry of Materials, 2019, 31 (9), pp.3154-3162. ⟨10.1021/acs.chemmater.8b04936⟩
Chemistry of Materials, American Chemical Society, 2019, 31 (9), pp.3154-3162. ⟨10.1021/acs.chemmater.8b04936⟩
International audience; Graphene presents a real need for patterning into very narrow nanostructures to open up a band gap and tune its electrical properties by quantum confinement. A self-assembled silicon-based block copolymer (BCP) is used to patt
Autor:
Olivier Renault, Gilles Cunge, Denis Mariolle, Javier Arias-Zapata, Vincent Bouchiat, Hanako Okuno, Nicolas Chevalier, Djawhar Ferrah, Daniil Marinov, Denis Rouchon
Publikováno v:
ACS Applied Nano Materials
ACS Applied Nano Materials, 2019, 2 (3), pp.1356-1366. ⟨10.1021/acsanm.8b02249⟩
ACS Applied Nano Materials, 2019, 2 (3), pp.1356-1366. ⟨10.1021/acsanm.8b02249⟩
The impact on the electronic and structural properties of chemical vapor deposition (CVD) graphene transferred onto SiO2/silicon (Si) of continuous H2-based plasmas, used to remove sticky residues composed of poly(methyl methacrylate) (PMMA) and Si-b
Autor:
Gilles Cunge, Sophie Böhme, Javier Arias-Zapata, Marc Zelsmann, Hanako Okuno, Jérôme Garnier, Djawhar Ferrah, O. Mouray
Publikováno v:
Materials Today: Proceedings. 4:6827-6834
Large-area graphene is not suitable for digital logic applications because its bandgap is zero. Graphene structuration into sub-10nm width nanoribbons (GNRs) can open up a bandgap (>0.4eV) for operational nanoelectronics devices such as field-effect
Autor:
Marc Zelsmann, Javier Arias-Zapata, Antoine Legrain, Jérôme Garnier, Cécile Girardot, Sophie Böhme
Publikováno v:
Micro and Nano Engineering
Micro and Nano Engineering, Elsevier, 2018, 1, pp.56-62
Micro and Nano Engineering, 2018, 1, pp.56-62
Micro and Nano Engineering, Elsevier, 2018, 1, pp.56-62
Micro and Nano Engineering, 2018, 1, pp.56-62
Ultra high resolution lithography (sub-15 nm) could be developed using the directed self-assembly of block copolymers (BCPs), for which a high incompatibility – i.e. high-χ – between the blocks is necessary. Here we present an industrial compati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e3cd03f93e7acb04d2dd79ccdc8c3f2d
https://hal.univ-grenoble-alpes.fr/hal-01954875
https://hal.univ-grenoble-alpes.fr/hal-01954875
Autor:
Javier Arias-Zapata, Christophe Navarro, Marc Zelsmann, Antoine Legrain, Muhammad Waseem Mumtaz, Ian Cayrefourcq, Xavier Chevalier, Guillaume Fleury
Publikováno v:
ACS applied materialsinterfaces. 9(49)
A promising alternative for the next-generation lithography is based on the directed self-assembly of block copolymers (BCPs) used as a bottom-up tool for the definition of nanometric features. Herein, a straightforward integration flow for line-spac