Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Jau-Shi Jay Jun"'
Autor:
Egon Marx, Robert D. Larrabee, Richard M. Silver, Mark P. Davidson, Jau-Shi Jay Jun, Michael Bishop, Ravikiran Attota, Michael T. Stocker
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a957936cf31a9e70632a7fe399a03458
https://doi.org/10.1117/12.539028
https://doi.org/10.1117/12.539028
Autor:
Richard M. Silver, Michael T. Stocker, Mark P. Davidson, Jau-Shi Jay Jun, Egon Marx, Robert D. Larrabee, Ravikiran Attota, Michael Bishop
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::975d1088ba632487beb6e43b191b6e1d
https://doi.org/10.1117/12.539164
https://doi.org/10.1117/12.539164
Autor:
Robert D. Larrabee, Egon Marx, Michael Bishop, Ravikiran Attota, Michael T. Stocker, Richard M. Silver, Mark P. Davidson, Jau-Shi Jay Jun
Publikováno v:
SPIE Proceedings.
Critical dimensions in current and next generation devices are driving the need for tighter overlay registration tolerances and improved overlay metrology tool accuracy and repeatability. Tool matching, performance evaluation, and a move towards clos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a641270f8402275d41026a41868b9294
https://doi.org/10.1117/12.488486
https://doi.org/10.1117/12.488486
Autor:
Robert D. Larrabee, Richard M. Silver, Ravikiran Attota, Mark P. Davidson, Jau-Shi Jay Jun, Egon Marx, Michael T. Stocker
Publikováno v:
SPIE Proceedings.
New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We ha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1a21f88376dbabc348e678a61cb0f6c0
https://doi.org/10.1117/12.488481
https://doi.org/10.1117/12.488481
Comparison of measured optical image profiles of silicon lines with two different theoretical models
Autor:
Michael T. Stocker, Ravikiran Attota, Robert D. Larrabee, Richard M. Silver, Egon Marx, Mark P. Davidson, Jau-Shi Jay Jun, Beth Russo
Publikováno v:
SPIE Proceedings.
In this paper, we describe a new method for the separation of tool-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the too
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d86421c767cc3ee9198163c776b052f7
https://doi.org/10.1117/12.473479
https://doi.org/10.1117/12.473479
Publikováno v:
SPIE Proceedings.
Accurate overlay measurements rely on robust, repeatable, and accurate feature position determination. In our effort to develop traceable overlay standards we have examined a number of edge detection methods and the parameters which affect those meas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec30499a18c4cd7faac00b391de2e4eb
https://doi.org/10.1117/12.436777
https://doi.org/10.1117/12.436777
Autor:
E. Clayton Teague, Fredric Scire, John S. Villarrubia, John A. Kramar, William B. Penzes, Jau-Shi Jay Jun
Publikováno v:
SPIE Proceedings.
At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by 5
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2fd54b1681e3e6041d06634c999795bf
https://doi.org/10.1117/12.371144
https://doi.org/10.1117/12.371144
Autor:
Jau-Shi Jay Jun, E. Clayton Teague, E Amatucci, John S. Villarrubia, Fredric Scire, John A. Kramar, David E. Gilsinn, William B. Penzes
Publikováno v:
SPIE Proceedings.
We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f36e4ade532bd8b6bbfb41a6811d6c5
https://doi.org/10.1117/12.350791
https://doi.org/10.1117/12.350791
Autor:
H. Zou, Bradley N. Damazo, Satoshi Gonda, Carsten P. Jensen, Richard M. Silver, Jau-Shi Jay Jun, Lowell P. Howard
Publikováno v:
Optical Engineering. 43:79
We develop a new implementation of a Michelson interferometer designed to make measurements with an uncertainty of less than 20 pm. This new method uses a tunable diode laser as the light source, with the diode laser wavelength continuously tuned to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df8e3bd1f9399a4826ff21087b44619d
https://doi.org/10.1117/1.1631002
https://doi.org/10.1117/1.1631002