Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Jason Keleher"'
Publikováno v:
ECS Journal of Solid State Science and Technology. 11:123006
The development of post-Chemical Mechanical Planarization (p-CMP) cleaning processes is critical for the continued miniaturization of Integrated Circuit (IC) and logic device architecture. In order for further extension of Moore’s Law the minimizat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cadbbdc6c36da4fca5acc8569701b94
https://doi.org/10.1149/2162-8777/aca932
https://doi.org/10.1149/2162-8777/aca932
Autor:
Jason Keleher, Abigail L. Dudek
Publikováno v:
ECS Meeting Abstracts. :2352-2352
As integrated circuit (IC) technology continues to advance, the challenge to extend Moore’s law without sacrificing power density and energy efficiency is critical. One method of achieving these goals is through the utilization of Chemical Mechanic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b22588cdb6b615320dd1f325588eb97c
https://doi.org/10.1149/ma2022-02642352mtgabs
https://doi.org/10.1149/ma2022-02642352mtgabs
Autor:
Kiana Cahue, Jason Keleher
Publikováno v:
ECS Meeting Abstracts. :2354-2354
Wide band gap (WBG) semiconductors have become of great interest in order to extend Moore’s Law beyond the limitations of current Si IC technology. WBG material, more specifically gallium nitride (GaN), is known to operate at greater switching spee
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::23c92b1577bc260b8b359aea881f4a44
https://doi.org/10.1149/ma2022-02642354mtgabs
https://doi.org/10.1149/ma2022-02642354mtgabs
