Zobrazeno 1 - 10
of 37
pro vyhledávání: '"Jani Hämäläinen"'
Publikováno v:
Journal of Applied Crystallography. 53:369-380
IrO2 is an important material in numerous applications ranging from catalysis to the microelectronics industry, but despite this its behaviour upon annealing under different conditions has not yet been thoroughly studied. This work provides a detaile
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5dded5ea3d78770271adc74de604fb03
https://doi.org/10.1107/s1600576720001053
https://doi.org/10.1107/s1600576720001053
Autor:
Yuma Sugai, Toshihiko Sato, Hironori Sugata, Yohei Sakano, Satoshi Okuyama, Takuya Sugawara, Muhammad Safdar, Jani Hämäläinen, Tommi Suni
Publikováno v:
Optical Interference Coatings Conference (OIC) 2022.
Magnesium fluoride (MgF2) thin films deposited using atomic layer deposition (ALD) were studied for use as optical coatings. The deposition was performed in a commercially available Picosun R-200 Advanced ALD reactor. Characterization of these films
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8cc650256b80ea800bf61c142fc6bdb8
https://doi.org/10.1364/oic.2022.tc.5
https://doi.org/10.1364/oic.2022.tc.5
Autor:
Minna Räisänen, Eeva Heliövaara, Feda'a Al‐Qaisi, Mikko Muuronen, Aleksi Eronen, Henri Liljeqvist, Martin Nieger, Marianna Kemell, Karina Moslova, Jani Hämäläinen, Kalle Lagerblom, Timo Repo
Publikováno v:
Angewandte Chemie. 130:17350-17355
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::685fdb87d412fd03be482471683125be
https://doi.org/10.1002/ange.201810447
https://doi.org/10.1002/ange.201810447
Autor:
Jani Hämäläinen, Jiyeon Kim, Markku Leskelä, Kristoffer Meinander, Anjana Devi, Marianna Kemell, Radim Beranek, Jyrki Räisänen, Tomi Iivonen, Kenichiro Mizohata, Lidong Wang
Publikováno v:
Chemistry of Materials. 29:5796-5805
We have developed a low-temperature atomic layer deposition (ALD) process for depositing crystalline and phase pure spinel cobalt oxide (Co3O4) films at 120 °C using [Co(tBu2DAD)2] and ozone as coreagent. X-ray diffraction, UV–vis spectroscopy, at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::074a2eebd8a1920a49a64a7fe3cab005
https://doi.org/10.1021/acs.chemmater.6b05346
https://doi.org/10.1021/acs.chemmater.6b05346
Autor:
Wojciech Macyk, Jani Hämäläinen, Marcin Surówka, Markku Leskelä, Mateusz Trochowski, Tomi Iivonen, Marcin Kobielusz, Krystian Mroz
Synthetic procedures, including doping, sintering and surface coating, can noticeably affect the physicochemical properties of semiconductors. Introduced changes very often translate into photocatalytic and photoelectrochemical activity alterations.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::03c60266645e43a47c223a8f3d933b77
https://ruj.uj.edu.pl/xmlui/handle/item/148158
https://ruj.uj.edu.pl/xmlui/handle/item/148158
Autor:
Jani Hämäläinen, Jyrki Räisänen, Markku Leskelä, Mikko Ritala, Mikko Heikkilä, Pasi Jalkanen, Miika Mattinen, Kenichiro Mizohata, Marko Vehkamäki
Publikováno v:
The Journal of Physical Chemistry C. 120:15235-15243
Atomic layer deposition (ALD) is an advanced thin-film deposition method based on self-limiting surface reactions that allows for the controlled deposition of conformal, high-quality thin films of various materials. In this study, we aimed to explore
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22467e855437accaa861439306b59406
https://doi.org/10.1021/acs.jpcc.6b04461
https://doi.org/10.1021/acs.jpcc.6b04461
Autor:
Mikko Ritala, Ville Miikkulainen, M. Parenti, Miia Mäntymäki, Michelle M. Paquette, Sean W. King, J. Bielefeld, E. Mays, William A. Lanford, Nancy J. Dudney, Wyatt E. Tenhaeff, Donghyi Koh, Anthony N. Caruso, Jani Hämäläinen, Sanjay K. Banerjee, K. B. Klepper, Bradley J. Nordell, Ola Nilsen
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 371:211-215
In this paper, 15N nuclear reaction analysis (NRA) for H is combined with 1.2 MeV deuteron (D) NRA which provides a simultaneous analysis for Li, Be, B, C, N, O and F. The energy dependence of the D NRA has been measured and used to correct for the D
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b65380ecd0a8d150fdb66b714a4d16c
https://doi.org/10.1016/j.nimb.2015.10.052
https://doi.org/10.1016/j.nimb.2015.10.052
Autor:
Henri Liljeqvist, Marianna Kemell, Timo Repo, Feda'a M. Al-Qaisi, Minna T. Räisänen, Martin Nieger, Jani Hämäläinen, Karina Moslova, Aleksi Eronen, Mikko Muuronen, Kalle Lagerblom, Eeva Heliövaara
Dissolution of elemental gold in organic solutions is a contemporary approach to lower the environmental burden associated with gold recycling. Herein, we describe fundamental studies on a highly efficient method for the dissolution of elemental Au t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c3590d1464bc5c88821ac6ef3952edd1
http://hdl.handle.net/10138/324826
http://hdl.handle.net/10138/324826
Autor:
Miika Mattinen, Markku Leskelä, Marko Vehkamäki, Mikko Ritala, Kristoffer Meinander, Jani Hämäläinen, Jyrki Räisänen, Kenichiro Mizohata
Publikováno v:
Angewandte Chemie (International ed. in English). 57(44)
Rhenium is both a refractory metal and a noble metal that has attractive properties for various applications. Still, synthesis and applications of rhenium thin films have been limited. We introduce herein the growth of both rhenium metal and rhenium
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::78f7cf3cca9dc24e4c0495dd1469448c
https://pubmed.ncbi.nlm.nih.gov/30048031
https://pubmed.ncbi.nlm.nih.gov/30048031
Autor:
Jyrki Räisänen, Marko Vehkamäki, Miika Mattinen, Markku Leskelä, Mikko Ritala, Kenichiro Mizohata, Kristoffer Meinander, Jani Hämäläinen
2D materials research is advancing rapidly as various new “beyond graphene” materials are fabricated, their properties studied, and materials tested in various applications. Rhenium disulfide is one of the 2D transition metal dichalcogenides that
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4e1e2ff1b936ff0e9e0f79e55ae5ba43
http://hdl.handle.net/10138/326483
http://hdl.handle.net/10138/326483