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pro vyhledávání: '"Jan-Willem Bosker"'
Autor:
Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters, Roderik van Es, Jan-Willem Bosker, Alexander Zdravkov, Egbert Lenderink, Fabrizio Evangelista, Par Broman, Bartosz Bilski, Thorsten Last
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII
With the introduction of its fifth-generation EUV scanner, the NXE:3400B, ASML has brought EUV to High-Volume Manufacturing for sub-10nm node lithography. This paper presents lithographic performance results obtained with the NXE:3400B, characterized
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0f8754328431986d3b7249064a5871a1
https://doi.org/10.1117/12.2258025
https://doi.org/10.1117/12.2258025
