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pro vyhledávání: '"Jan-Pieter Kiujten"'
Autor:
Jan-Pieter Kiujten, Robert John Socha, Lloyd C. Litt, Greg P. Hughes, Arjan Verhappen, Eric L. Fanucchi, Laurent Dieu, Will Conley, David Mellenthin, Kevin D. Lucas, John Maltabes, Kurt E. Wampler
Publikováno v:
SPIE Proceedings.
Semiconductor manufacturers are increasingly focusing on contact and via layers as the most difficult lithography pattern. Focus and exposure latitude, MEF, as well as iso-dense bias are challenges for contact patterning. This situation is only expec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4db9090fa53950483dd1aeca51f0f5d
https://doi.org/10.1117/12.467783
https://doi.org/10.1117/12.467783
