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Autor:
Christian Patzig, Jens Beyersdorfer, Joerg Siegert, Franz Schrank, Matthias Petzold, Viorel Dragoi, Jan-Paul Krugers, Peter Czurratis, Sebastian Brand
Publikováno v:
12th International Symposium on Semiconductor Wafer Bonding: Science, Technology, and Applications-ECS Fall 2012 Meeting, 7 October 2012 through 12 October 2012, Honolulu, HI, 7, 50, 227-239
In this paper, a brief summary of potential defect formation and failure characteristics for low temperature plasma-assisted Si wafer bonding in correlation to different influencing factors is given. In terms of a failure catalogue classification, th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::87cbab5b9b04a365b00d42c7905576f6
http://resolver.tudelft.nl/uuid:9f249e39-4efe-422e-b32d-a57d876733c4
http://resolver.tudelft.nl/uuid:9f249e39-4efe-422e-b32d-a57d876733c4