Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Jan O. Gaudestad"'
Autor:
Juan M. Trujillo-Sevilla, Óscar Casanova-González, Alex Roqué-Velasco, Miguel Jesús Sicilia, Jose Manuel Ramos-Rodríguez, Jan O. Gaudestad
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Juan M. Trujillo-Sevilla, Óscar Casanova-González, Alex Roqué-Velasco, Javier González Pardo, José Manuel Ramos-Rodríguez, Jan O. Gaudestad
Publikováno v:
Photonic Instrumentation Engineering X.
Autor:
Juan M. Trujillo-Sevilla, Alex Roqué-Velasco, Miguel Jesús Sicilia, Óscar Casanova-González, Jose Manuel Ramos-Rodríguez, Jan O. Gaudestad
Publikováno v:
Emerging Imaging and Sensing Technologies for Security and Defence VII.
Autor:
Juan M. Trujillo-Sevilla, Óscar Gómez-Cárdenes, Alex Roqué-Velasco, Miguel A. Sicilia, Javier González Pardo, José Manuel Ramos-Rodríguez, Jan O. Gaudestad
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Autor:
Juan M. Trujillo-Sevilla, Alex Roqué-Velasco, Miguel Jesús Sicilia, Óscar Casanova-González, José Manuel Rodríguez-Ramos, Jan O. Gaudestad
Publikováno v:
Novel Optical Systems, Methods, and Applications XXV.
Autor:
Juan M. Trujillo-Sevilla, Álvaro Pérez-García, Óscar Casanova-González, Miriam Velasco-Ocaña, Sabato Ceruso, Ricardo Oliva-García, Óscar Gómez-Cárdenes, Javier Martín-Hernández, Alex Roqué-Velasco, José Manuel Rodríguez-Ramos, Jan O. Gaudestad
Publikováno v:
Photonic Instrumentation Engineering IX.
Autor:
Miriam Velasco-Ocaña, Javier Martín-Hernández, J. M. Trujillo-Sevilla, Álvaro Pérez-García, Alex Roqué-Velasco, Oscar Casanova-González, José Manuel Ramos, Óscar Gómez-Cárdenes, Sabato Ceruso, Jan O. Gaudestad, Ricardo Oliva-García
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
Publikováno v:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In this paper we introduce a new metrology technique for measuring wafer geometry on silicon wafers. Wave Front Phase Imaging (WFPI) has high lateral resolution and is sensitive enough to measure roughness on a silicon wafer by simply acquiring a sin
Publikováno v:
2020 China Semiconductor Technology International Conference (CSTIC).
In this paper we introduce a new metrology technique for measuring wafer geometry on silicon wafers. Wafer geometry will be critical for the next generation integrated circuits (IC) for improvements in lithography overlay and to measure Nanotopograph
Autor:
J. P. Luke, Jan O. Gaudestad, José Manuel Rodríguez-Ramos, Ángela Hernández-Delgado, Óscar Gómez-Cárdenes, Ricardo Oliva-García, Javier Martín-Hernández
Publikováno v:
Three-Dimensional Imaging, Visualization, and Display 2020.
Points of view generation allows to create virtual views between two or more cameras observing a scene. This field receives attention from multimedia markets, because sufficiently realistic points of view generation should allow to navigate freely be