Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Jan Heumann"'
Autor:
Greta Carmona-Antoñanzas, Stephen N Carmichael, Jan Heumann, John B Taggart, Karim Gharbi, James E Bron, Michaël Bekaert, Armin Sturm
Publikováno v:
PLoS ONE, Vol 10, Iss 9, p e0137394 (2015)
Salmon lice, Lepeophtheirus salmonis (Krøyer, 1837), are fish ectoparasites causing significant economic damage in the mariculture of Atlantic salmon, Salmo salar Linnaeus, 1758. The control of L. salmonis at fish farms relies to a large extent on t
Externí odkaz:
https://doaj.org/article/37e7c456e05a4e5280b2ce32d062edc8
Autor:
Yutaka Kodera, Karen D. Badger, Takeshi Isogawa, Jed H. Rankin, Shinji Akima, Masayuki Kagawa, Anka Birnstein, Jan Heumann, Yusuke Toda, Yoshida Itaru, Masashi Yonetani
Publikováno v:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
Based on the record for reasonable throughput, 19x nm wavelength inspection is one of the strongest candidates available today for the initial EUV (Extreme Ultraviolet) mask inspection approach until high-throughput E-Beam or actinic inspection is re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::777b10635a9e310f564cd9e50649a55e
https://doi.org/10.1117/12.2537430
https://doi.org/10.1117/12.2537430
Autor:
Toshio Konishi, Karen D. Badger, Takeshi Isogawa, Kazunori Seki, Jan Heumann, Masashi Yonetani, Anka Birnstein, Yutaka Kodera
Publikováno v:
Photomask Technology 2018.
EUV (Extreme Ultraviolet) lithography is one of the most promising techniques for imaging 5-nm node and beyond wafer features. Mask defects that matter are the ones that print during exposure at 13.5 nm wavelength. To support EUV development and prod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e8922b98ff7279b175d5d126143d9f03
https://doi.org/10.1117/12.2503808
https://doi.org/10.1117/12.2503808
Autor:
Takeshi Isogawa, Jan Heumann, Masayuki Kagawa, Yusuke Toda, Masashi Yonetani, Karen D. Badger
Publikováno v:
Photomask Technology 2018.
EUV (Extreme Ultraviolet) lithography is one of the key enabling techniques for imaging 7-nm node and beyond wafer technologies. To ensure mask quality levels will support High Volume Manufacturing (HVM), all “defects that matter”, must be identi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ce6140e8a3bde71731631696c5903f7
https://doi.org/10.1117/12.2502560
https://doi.org/10.1117/12.2502560
Autor:
Kazunori Seki, Takeshi Isogawa, Masashi Yonetani, Jan Heumann, Karen D. Badger, Yutaka Kodera, Toshio Konishi, Anka Birnstein
Publikováno v:
Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology.
19x nm defect inspection is the strongest candidate for initial EUV production until high-throughput E-Beam or Actinic inspection is ready. However, EUV mask inspection on an optical, 19x nm wavelength tool has some difficulties compared to optical m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4df479b78f67f0e1f71d35ca8a41f7d
https://doi.org/10.1117/12.2502006
https://doi.org/10.1117/12.2502006
Publikováno v:
Aquaculture. :207-214
The salmon louse Lepeophtheirus salmonis (Kroyer, 1837) is an ectoparasite of salmonid fish severely affecting cultured salmon production in the North Atlantic. Salmon louse control on farms currently relies in part upon the use of veterinary drugs;
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61a359db7d63cc759389ed701d0f0969
https://doi.org/10.1016/j.aquaculture.2013.12.015
https://doi.org/10.1016/j.aquaculture.2013.12.015
Publikováno v:
Aquaculture. :40-47
Emamectin benzoate (EMB; SLICE®) has been the drug of choice for the control of sea lice in salmon aquaculture within the past decade due to its ease of administration as well as efficacy on all parasitic stages of sea lice. This over-reliance has l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2733d266fe189762e23e54bb97560a4d
https://doi.org/10.1016/j.aquaculture.2012.03.026
https://doi.org/10.1016/j.aquaculture.2012.03.026
Autor:
Katharina Pawlowski, Anna Zdyb, Jan Heumann, Ivo Feussner, Cornelia Mrosk, Peter Grzeganek, Kirill N. Demchenko, Cornelia Göbel, Bettina Hause
Publikováno v:
New Phytologist. 189:568-579
Jasmonic acid (JA) is a plant signalling compound that has been implicated in the regulation of mutualistic symbioses. In order to understand the spatial distribution of JA biosynthetic capacity in nodules of two actinorhizal species, Casaurina glauc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7ad4635eead815b168c44d6f0a102f8c
https://doi.org/10.1111/j.1469-8137.2010.03504.x
https://doi.org/10.1111/j.1469-8137.2010.03504.x
Publikováno v:
SPIE Proceedings.
Achieving the required critical dimensions (CD) with the best possible uniformity (CDU) on photo-masks has always played a pivotal role in enabling chip technology. Current control strategies are based on scanning electron microscopy (SEM) based meas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b48c0693afb90232aea1e8914972a31
https://doi.org/10.1117/12.965531
https://doi.org/10.1117/12.965531
Autor:
G. R. Cantrell, Clemens Utzny, Martin Sczyrba, Stefan Meusemann, Christian Bürgel, Jan Heumann
Publikováno v:
SPIE Proceedings.
Strict reticle critical dimension (CD) control is needed to supply ≤ 20nm wafer technology nodes. In front end lithographic processes for example, precise temperature control in resist baking steps is considered paramount to limiting reticle CD err
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59c40819d3e7322c7830e64340052347
https://doi.org/10.1117/12.964671
https://doi.org/10.1117/12.964671