Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jan F. W. Cavelaars"'
Autor:
Sang-In Han, Soon-Cheon Seo, Jan F. W. Cavelaars, Dave Krick, Patrick A. Kearney, John Maltabes
Publikováno v:
SPIE Proceedings.
One of the main challenges for EUV mask blank metrology is that most tools are designed for either; 1) wafer handling, 2) off-line characterization, or 3) destructive failure analysis. Few clean room-compatible metrology tools for full EUV mask blank
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e46454e870ff825aeb89b81bd6d29ff8
https://doi.org/10.1117/12.598860
https://doi.org/10.1117/12.598860
Publikováno v:
SPIE Proceedings.
One of the key challenges for the successful implementation of EUV Lithography (EUVL) is the supply of defect free mask blanks. Obviously a reliable defect inspection is a prerequisite to achieve this goal. We report results from a EUVL blank inspect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::12f80343485cfe11c7e07949f372aadc
https://doi.org/10.1117/12.518388
https://doi.org/10.1117/12.518388