Zobrazeno 1 - 10
of 30
pro vyhledávání: '"Jan‐Lucas Wree"'
Autor:
Thomas Berning, Malte Becher, Jan-Lucas Wree, Julia Jagosz, Aleksander Kostka, Andreas Ostendorf, Anjana Devi, Claudia Bock
Publikováno v:
Materials Research Express, Vol 9, Iss 11, p 116401 (2022)
Transition metal dichalcogenides (TMDCs) such as tungsten disulfide (WS _2 ) are studied for advanced electronic and optical devices because of their unique and versatile electrical, optical and mechanical properties. For the use of TMDC films in nex
Externí odkaz:
https://doaj.org/article/09eea56191dc44eaabbdaa0e904443dc
Autor:
Jan-Lucas Wree, Jean-Pierre Glauber, David Zanders, Detlef Rogalla, Malte Becher, Matthew B. E. Griffiths, Andreas Ostendorf, Seán T. Barry, Andreas Ney, Anjana Devi
Publikováno v:
ACS Applied Electronic Materials. 4:3772-3779
Autor:
Parmish Kaur, Arbresha Muriqi, Jan-Lucas Wree, Ramin Ghiyasi, Muhammad Safdar, Michael Nolan, Maarit Karppinen, Anjana Devi
Publikováno v:
Dalton Transactions
openaire: EC/H2020/765378/EU//HYCOAT Funding Information: This project has received funding from the European Union's Horizon 2020 research and innovation programme under the Marie Skłodowska-Curie grant agreement (No. 765378). P. K., A. M. and R. G
Autor:
Nils Boysen, Jan-Lucas Wree, David Zanders, Detlef Rogalla, Denis Öhl, Wolfgang Schuhmann, Anjana Devi
Publikováno v:
ACS applied materialsinterfaces. 14(46)
Thin films of iridium can be utilized in a wide range of applications and are particularly interesting for catalytic transformations. For the scalable deposition of functional Ir thin films, metal-organic chemical vapor deposition (MOCVD) is the meth
Autor:
null Thomas Berning, null Malte Becher, null Jan-Lucas Wree, null Julia Jagosz, null Aleksander Kostka, null Andreas Ostendorf, null Anjana Devie, null Claudia Bock
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f52887fdb4405a9b805289c4a756f206
https://doi.org/10.1088/2053-1591/ac9bd0/v2/response1
https://doi.org/10.1088/2053-1591/ac9bd0/v2/response1
Autor:
Detlef Rogalla, Denis Öhl, Alessia Niesen, Aleksander Kostka, Anjana Devi, Jan-Lucas Wree, Jean-Pierre Glauber, Wolfgang Schuhmann
Publikováno v:
Journal of Materials Chemistry C. 9:10254-10265
The unique structural and electronic properties of transition metal dichalcogenides (TMDs) and in particular tungsten disulphide (WS2) make them interesting for a variety of applications such as the electrocatalytic hydrogen evolution reaction (HER)
Autor:
Klaus Schierbaum, Anjana Devi, Jan-Lucas Wree, Aleksander Kostka, Andreas Ostendorf, Nils Boysen, David Zanders, Engin Ciftyurek, Maren Kasischke, Detlef Rogalla
Publikováno v:
Dalton Transactions. 49:13462-13474
Molybdenum disulfide (MoS2) is known for its versatile properties and hence is promising for a wide range of applications. The fabrication of high quality MoS2 either as homogeneous films or as two-dimensional layers on large areas is thus the object
Autor:
Zhongshan Li, Yujiao Li, Klaus Schierbaum, Michael Wark, Alfred Ludwig, Dennis Zywitzki, Daniel M. Baier, Dereje H. Taffa, Jan-Lucas Wree, Raoul Schaper, Detlef Rogalla, Anjana Devi, Engin Ciftyurek, Michael Meischein
Publikováno v:
Zywitzki, D, Schaper, R, Ciftyürek, E, Wree, J L, Taffa, D H, Baier, D M, Rogalla, D, Li, Y, Meischein, M, Ludwig, A, Li, Z, Schierbaum, K, Wark, M & Devi, A 2021, ' Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films : Investigation of Structure and Pseudocapacitive Properties ', Advanced Materials Interfaces, vol. 8, no. 20, 2100949 . https://doi.org/10.1002/admi.202100949
Transition metal ferrites, such as CoFe2O4 (CFO) and NiFe2O4 (NFO), have gained increasing attention as potential materials for supercapacitors. Since chemical vapor deposition (CVD) offers advantages like interface quality to the underlying substrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2172adf953d76dad705dc5a9e8affa5
https://pure.au.dk/ws/files/285212173/Adv_Materials_Inter_2021_Zywitzki_Chemical_Vapor_Deposition_of_Cobalt_and_Nickel_Ferrite_Thin_Films_Investigation_of.pdf
https://pure.au.dk/ws/files/285212173/Adv_Materials_Inter_2021_Zywitzki_Chemical_Vapor_Deposition_of_Cobalt_and_Nickel_Ferrite_Thin_Films_Investigation_of.pdf
Autor:
David Zanders, Jorit Obenlüneschloß, Jan‐Lucas Wree, Julia Jagosz, Parmish Kaur, Nils Boysen, Detlef Rogalla, Aleksander Kostka, Claudia Bock, Denis Öhl, Michael Gock, Wolfgang Schuhmann, Anjana Devi
Publikováno v:
Advanced Materials Interfaces. 9:2201709
Autor:
Arbresha Muriqi, Bujamin Misimi, Anjana Devi, Thomas Riedl, Detlef Theirich, Detlef Rogalla, Tim Hasselmann, Nils Boysen, Michael Nolan, Tobias Haeger, Jan-Lucas Wree
This paper demonstrates a carbene stabilized precursor [Cu(tBuNHC)(hmds)] with suitable volatility, reactivity and thermal stability, that enables the spatial plasma-enhanced atomic layer deposition (APP-ALD) of copper thin films at atmospheric press
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a7202aab376a5551729595b7ce8fa369
https://hdl.handle.net/10468/10759
https://hdl.handle.net/10468/10759