Zobrazeno 1 - 10
of 24
pro vyhledávání: '"James W. Proscia"'
Publikováno v:
Chemistry of Materials. 11:3490-3496
The atmospheric pressure chemical vapor deposition of titanium aluminum nitride films was accomplished using a three-precursor system comprised of titanium tetrachloride, tert-butylamine, and trimethylaluminum at a substrate temperature of 600 °C. S
Publikováno v:
Inorganic Chemistry. 33:1227-1229
Publikováno v:
Chemistry of Materials. 4:1144-1146
Autor:
T. Suren Lewkebandara, Philip H. Sheridan, Mary Jane Heeg, James W. Proscia, Charles H. Winter
Publikováno v:
Journal of the American Chemical Society. 114:1095-1097
Monomeric titanium and zirconium complexes with multiple bonds to oxygen, sulfur, and nitrogen have attracted considerable attention due to their novel structural features and interesting reactivity. Recently, we have initiated a research program tha
Publikováno v:
MRS Proceedings. 363
Atmospheric Pressure Chemical Vapor Deposition (APCVD) and powder spray pyrolysis are both pyrolytic thin film deposition techniques that are used to coat glass with thin films at atmospheric pressure. In the present study, the fluid dynamics of each
Autor:
Joan Rodriguez, James W. Proscia, Narayan Malani, Keith B. Williams, Ogie Stewart, Gene P. Reck
Publikováno v:
MRS Proceedings. 335
Vanadium oxide thin films were grown on glass substrates by atmospheric pressure chemical vapor deposition (APCVD) from the reaction of vanadium(IV) chloride with isopropanol and t-butanol. Films were deposited in the temperature range 250 to 450°C.
Publikováno v:
MRS Proceedings. 327
Herein we report our efforts to prepare new precursors to niobium nitride (NbN) and tantalum nitride (TAN, Ta3N5) thin films. Treatment of MC15 (M = Nb, Ta) with tertbutylamine in benzene solvent affords complexes of the formula [MCI2 (NtBu)(NHtBu)(N
Publikováno v:
MRS Proceedings. 324
The premixability of reagents used in chemical vapor deposition reactors is important to insure that gas feed lines and nozzles do not become clogged with particulates during operation. Even if reactants are to be kept separate until introduced into
Publikováno v:
MRS Proceedings. 327
The reaction of titanium (IV) chloride and amines in an atmospheric pressure chemical vapor deposition (APCVD) has been previously shown to produce high quality titanium nitride films. These films were gold in appearance with high infrared reflectivi
Publikováno v:
MRS Proceedings. 327
Vanadium nitride films reflect infrared radiation and are candidates for solar control coatings for glass. Herein we report our efforts to prepare new precursors to vanadium nitride coatings. Treatment of vanadium tetrachloride with primary alkylamin