Výsledky vyhledávání - "James Schlueter"

Mechanistic Understanding of the Planarization Behavior of Low κ Organosilicate Glass Films with Beol Barrier Slurries

Autor: Anupama Mallikarjunan, Jennifer Achtyl, Rung-Je Yang, Chen-Yuan Huang, Shih-Hsuan Chao, Lu Gan, Robert Ridgeway, James Schlueter, Ming-Shih Tsai, Chris Li, Mark O'Neill

Publikováno v: ECS Meeting Abstracts. :1032-1032

Low κ Organosilicate Glass (OSG) films are being proliferated into new IC device architectures with CMP requirements spanning a wide range (highly selective to non-selective, low polish rates to high polish rates). This study aims to understand the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5e65035e06d074cb00894584d5dcca25
https://doi.org/10.1149/ma2019-01/17/1032

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Modeling of Feature-Scale Planarization in STI CMP Using MESATM

Autor: Thomas Laursen, Inki Kim, James Schlueter

Publikováno v: MRS Proceedings. 671

MESA is a feature-scale planarization model that predicts the changing topography of the wafer surface during the chemical mechanical polishing (CMP) process used in IC manufacturing. This model has previously been applied to the polish of inter-leve

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::50dfedba3e26bdf8d98caab5d70c6404
https://doi.org/10.1557/proc-671-m4.2

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Slip Free Rapid Thermal Processing

Autor: Blake Julian G, John F. Moquin, Ron Capodilupo, James Schlueter, Jeffrey C. Gelpey

Publikováno v: MRS Proceedings. 92

Slip is a primary concern in Rapid Thermal Processing (RTP). Diagnostics for slip are compared, including: visual inspection, differential interference contrast microscopy (Nomarski), X-ray topography, decorative etching and optical surface scanning.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::24924b7929961dba0f6b9f7034964e26
https://doi.org/10.1557/proc-92-265

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