Zobrazeno 1 - 10
of 22
pro vyhledávání: '"James R. Sweeney"'
Autor:
Andrew R. Neureuther, James R. Sweeney, O. Dimov, R. Cirelli, Omkaram Nalamasu, Pat G. Watson, Ebo H. Croffie, Allen H. Gabor, F. M. Houlihan, M. Cheng, I. Rushkin
Publikováno v:
Microelectronic Engineering. 53:437-442
A new TCAD software tool named STORM (SimulationTOols forResistModels) has been developed to support the quantitative modeling of resist processes in deep submicron lithography. Models for post exposure bake, silylation, wet development and dry devel
Autor:
G. P. Watson, R. Cirelli, G. R. Weber, Allen H. Gabor, J. Bude, James R. Sweeney, William M. Mansfield, Omkaram Nalamasu, F. Klemens, F. M. Houlihan
Publikováno v:
Microelectronic Engineering. 53:87-90
We discuss the fabrication of a FLASH EEPROM floating gate memory device with a cell size of 0.0896@mm. The floating gate level utilized an alternating aperture phase shift mask, a binary mask was used to expose the control gate level. Linewidth chan
Autor:
James R. Sweeney
Publikováno v:
The Historian. 71:841-843
Autor:
Thomas Steinhausler, Murrae J. Bowden, Patrick Foster, Allen G. Timko, John J. Biafore, Gregory Spaziano, Richard S. Hutton, F. M. Houlihan, Ilya L. Rushkin, Allen H. Gabor, Sydney G. Slater, Elsa Reichmanis, Gary Dabbagh, James R. Sweeney, Ognian N. Dimov, Mark Neisser, Om Nalamasu, R. Cirelli, Arturo N. Medina, Andrew J. Blakeney
Publikováno v:
Journal of Photopolymer Science and Technology. 12:423-432
The performance of a 193nm single layer resist based on a norbornene-malefic anhydride matrix resin has been optimized through a series of statistical design experiments. The SDE demonstrated the importance of setting the PEB temperature above the SB
Autor:
Richard B. Barnett, Andrew F. Clark, R. L. Watson, William F. Tucker, Michael Berkowitz, Ali Akbar Mahdi, Leslie Bessant, Linda B. Hall, Lisa E. Emmerich, Gary M. Fink, David T. Morgan, Caroline Winterer, Katherine A. S. Sibley, Charles Chatfield, Cary D. Wintz, Jeff Seiken, James R. Sweeney, Yvonne Johnson, Benjamin H. Newcomb, Thomas Templeton Taylor, Russell D. Buhite, Kari Frederickson, Stephen Vaughn, Lex Renda, Lester D. Langley, Denise Riley, Charles Yates, Richard Lufrano, David L. White, Edward Fowler, Qiang Zhai, Surojit M. Gupta, Judith Wyman, Xiaoming Chen, Marian J. Rubchak, Cynthia F. Behrman, B. R. Burg, John Martin, Peter Linebaugh, Hugh D. Hudson, Vladimir Steffel, Howard Nenner, Bradford B. Blaine, C. Robert Phillips, Suzanne Marchand, Judith A. Degroat, Susan Mitchell Sommers, Peter G. Wallace, Albert Palazzo, Trevor Lloyd, Kenneth F. Ledford, Max J. Okenfuss, Peter Mentzel, Lee W. Eysturlid, R. C. Richardson, Clíona Murphy, Peter Gay, Steven Fanning, George Hupper, Simon Adams, Phyllis Culham, Alden A. Mosshammer, William A. Hoisington, Paul Edward Dutton, Karl G. Larew, Bernard S. Bachrach, John W. Long, Roger Adelson, Susan A. Crane, Larry M. Hall, Joseph C. Miller, Kevin Smith, Stuart Knee
Publikováno v:
The Historian. 60:107-198
Autor:
Raymond A. Cirelli, Donald M. Tennant, O. R. Wood, James R. Sweeney, Joseph Edward Griffith, Myrtle I. Blakey, D. L. White
Publikováno v:
SPIE Proceedings.
In dark-field (DF) lithography, light from the condenser illuminates the reticle at such a steep angle that non- diffracted light is lost from the system. A DF reticle contains a series of sub-resolution amplitude gratings to diffract light from the
Autor:
Pat G. Watson, F. Klemens, Raymond A. Cirelli, H. L. Maynard, James R. Sweeney, Omkaram Nalamasu, Gregory Timp, Armen Kroyan
Publikováno v:
SPIE Proceedings.
The properties of sub-resolution assist features for 193nm wavelength contact window lithography have been investigated. A test mask consisting of a variety of window and assist feature sizes and pattern density environments was fabricated and printe
Autor:
Omkaram Nalamasu, Raymond A. Cirelli, James R. Sweeney, Sydney G. Slater, Richard S. Hutton, Gary Dabbagh, Elsa Reichmanis, Francis M. Houlihan, Ilya L. Rushkin, Allen H. Gabor, Allen G. Timko, Ruey H. Wang, Mark Neisser, Arturo N. Medina, Ognian N. Dimov
Publikováno v:
SPIE Proceedings.
Through a series of statistical design experiments we optimized the lithographic performance of a 193 nm single layer resists based on a norbornene-maleic anhydride matrix resin. Several interesting findings were found including that having the PEB t
Autor:
James R. Sweeney
Publikováno v:
Journal of American History. 96:914-914
Publikováno v:
The Journal of Southern History. 73:500