Zobrazeno 1 - 10
of 17
pro vyhledávání: '"James R. Sounik"'
Publikováno v:
Photochemicalphotobiological sciences : Official journal of the European Photochemistry Association and the European Society for Photobiology. 13(12)
The photosensitive, alkyl- and alkylsiloxy-ligated silicon phthalocyanine, SiPc[(CH2)3SH][OSi(CH3)2(CH2)3N(CH3)2], Pc 227, has been prepared and characterized. This phthalocyanine yields the experimental photodynamic therapy (PDT) drug Pc 4, SiPc[OH]
Publikováno v:
Journal of Applied Polymer Science. 53:677-685
Slab waveguide directional couplers were fabricated from the third-order nonlinear optical polymer silicon phthalocyanine/methyl methacrylate 2/98 copolymer as the active material and poly(methyl methacrylate) as the cladding layer. The monomethacryl
Publikováno v:
Chemistry of Materials. 5:1253-1256
Autor:
Michael A. J. Rodgers, William E. Ford, Lee A. Schechtman, B. D. Rihter, Malcolm E. Kenney, James R. Sounik
Publikováno v:
ChemInform. 23
The synthesis and characterization of 30 Al, Ga, Si, and Sn naphthalocyanines relevant to the search for improved photodynamic therapy agents are reported. The compounds that have been studied are AlNcCl, AlNcOH, AlNcOSi-(n-C 6 H 13 ) 3 ...
Autor:
James R. Sounik, Malcolm E. Kenney, William E. Ford, Lee A. Schechtman, B. D. Rihter, Michael A. J. Rodgers
Publikováno v:
Inorganic Chemistry. 31:3371-3377
The synthesis and characterization of 30 Al, Ga, Si, and Sn naphthalocyanines relevant to the search for improved photodynamic therapy agents are reported. The compounds that have been studied are AlNcCl, AlNcOH, AlNcOSi-(n-C 6 H 13 ) 3 ...
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
Reversible Addition Fragmentation Chain Transfer (RAFT) technology has been developed for use in producing high yield low polydispersity (PD) polymers for many applications. RAFT technology is being used to produce low PD polymers and to allow contro
Autor:
Thomas Steinhaeusler, Ralph R. Dammel, Richard Vicari, Christopher L. McAdams, Michael T. Sheehan, Michael J. Leeson, Wang Yueh, C. Grant Willson, Mohammad Aslam, James R. Sounik
Publikováno v:
Advances in Resist Technology and Processing XIV.
Remarkable progress has been made in the formulation of chemically amplified resists for deep-UV (DUV or 248 nm) lithography. These materials are now in general use in full scale manufacturing. One of the deterrents to rapid and universal adoption of
Synthesis and lithographic performance of highly branched polymers from hydroxyphenylmethylcarbinols
Autor:
James R. Sounik, Ping-Hung Lu, Ralph R. Dammel, Stanley A. Ficner, Elaine Kokinda, Richard Vicari
Publikováno v:
SPIE Proceedings.
A new synthesis pathway for 4- and 2-hydroxymethylcarbinol (4- and 2-HPMC) has made a new class of highly branched polymers readily available. The polymers, which are isomers of polyhydroxystyrene, show unexpected dissolution behavior in aqueous base
Publikováno v:
SPIE Proceedings.
Third order nonlinear optical properties of side-chain methacrylate copolymers incorporating 4-amino-4'-nitrostilbene, 4-oxy-4'nitrostilbene, and functionalized silicon phthalocyanine chromophores are measured by picosecond degenerate four wave mixin
Publikováno v:
SPIE Proceedings.
Methods for the preparation of three siloxysilicon naphthalocyanines, a siloxygermanium tetraphenoxynaphthalocyanine, a siloxysilicon tetra-t-butyl-naphthalocyanine, a cofacial double-ring siloxysilicon naphthalocyanine, and a cofacial triple-ring si