Zobrazeno 1 - 10
of 13
pro vyhledávání: '"James P. DeYoung"'
Autor:
Ruben G. Carbonell, Joseph M. DeSimone, Douglas Taylor, Jaehoon Kim, James B. Mcclain, James P. DeYoung
Publikováno v:
Chemistry of Materials. 21:913-924
Copper (Cu) particles and films were produced by forming Cu(II) compound (Cu(hfac)2·H2O) films on substrates using a displacement from two immiscible supercritical phases (DISP) technique followed ...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0c70ebf99debd6afba9131e1bc30131
https://doi.org/10.1021/cm802659j
https://doi.org/10.1021/cm802659j
Autor:
Charles A. Jones, James B. McClain, Ruben G. Carbonell, Joseph M. DeSimone, James P. DeYoung, Amy E. Zweber
Publikováno v:
Critical Reviews in Solid State and Materials Sciences. 29:97-109
Condensed carbon dioxide (CO2) has emerged as a leading enabler of advanced semiconductor manufacturing processes. By exploiting the physical properties of CO2, some of the current challenges encountered in microelectronics processing related to shri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21808915f88298c14472c48a3795b497
https://doi.org/10.1080/10408430490888968
https://doi.org/10.1080/10408430490888968
Autor:
Charles A. Jones, Stephen M. Gross, James P. DeYoung, Joseph M. DeSimone, D. Yang, Eugene A. Irene, Mark I. Wagner
Publikováno v:
Chemistry of Materials. 15:2867-2869
A “dry” supercritical CO2-based etchant solution containing HF/pyridine as an anhydrous HF source effectively dissolves SiO2 thin films on silicon wafers. These dilute etchant solutions are active in removal of post-etch residues in back-end-of-l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e211d265cc73d6258109fae7be2af60
https://doi.org/10.1021/cm034235w
https://doi.org/10.1021/cm034235w
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 25(11)
The mechanism of developing an extreme ultraviolet (EUV) commercial photoresist with supercritical carbon dioxide (scCO2) and a CO2 compatible salt (CCS) solution was studied. The cloud point of CCS in CO2 and the pressure at which the photoresist di
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::069a441589dacbe1b872b8396d8fabfb
https://pubmed.ncbi.nlm.nih.gov/19466780
https://pubmed.ncbi.nlm.nih.gov/19466780
Autor:
James P. DeYoung, Mark Wagner, Chris Harbinson, Amy E. Zweber, Ruben G. Carbonell, Merrick Miles
Publikováno v:
SPIE Proceedings.
A novel method for the development of standard EUV photoresists in CO 2 using CO 2 compatible salts (CCS) is described and examined using a quartz crystal microbalance (QCM) technique in CO 2 . The fundamental steps of this development process are pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::106050ab1a0b520bcdd71a1e78614a0b
https://doi.org/10.1117/12.655881
https://doi.org/10.1117/12.655881
Publikováno v:
SPIE Proceedings.
Direct development of EUV resists in homogeneous carbon dioxide (CO2) solutions containing CO2 compatible salts (CCS) has been demonstrated. These CCS complexes have been designed and prepared such that the anion and/or the cation of the salt contain
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c37552b8a38703c429dbb41b18d410f
https://doi.org/10.1117/12.656272
https://doi.org/10.1117/12.656272
Autor:
Evangelos Gogolides, Chris Harbinson, James P. DeYoung, George P. Patsis, Vassilios Constantoudis, Mark I. Wagner
Publikováno v:
SPIE Proceedings.
Line Width Roughness (LWR) of resists constitutes one of the main obstacles in the race of further shrinking the feature dimensions of fabricated devices. Thus, the reduction and control of LWR is one of the biggest challenges of next generation lith
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::508c635192b4881d21689b40a807c00e
https://doi.org/10.1117/12.656579
https://doi.org/10.1117/12.656579
Publikováno v:
Fluoropolymers 1: Synthesis ISBN: 0306460602
Unlike a large portion of the many billions of pounds of organic and halogenated solvents used in industry every year, CO2 is inexpensive, of low toxicity, and environmentally and chemically benign. The prime factors inhibiting the widespread use of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ddb26742c1ac06115b21775bfeb2ee8a
https://doi.org/10.1007/0-306-46918-9_13
https://doi.org/10.1007/0-306-46918-9_13
Autor:
Stephen M. Gross, Carol A. Bessel, Pamela M. Visintin, Cynthia K. Schauer, James P. DeYoung, Ginger M. Denison, Joseph M. DeSimone
Publikováno v:
Journal of the American Chemical Society. 125(17)
The microelectronics industry is focused on increasing chip complexity, improving the density of electron carriers, and decreasing the dimensions of the interconnects into the sub-0.25 mum regime while maintaining high aspect ratios. Water-based chem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8688072e0e72de002dee0ffef5eee231
https://pubmed.ncbi.nlm.nih.gov/12708839
https://pubmed.ncbi.nlm.nih.gov/12708839
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.