Zobrazeno 1 - 10
of 16
pro vyhledávání: '"James M. Dykes"'
Publikováno v:
SPIE Proceedings.
When bimetallic thin films of Bi/In and Sn/In are laser exposed, they oxidize and become variably transparent. By controlling the writing laser power, binary and grayscale photomasks can be produced with the mask's transparency (optical density, OD),
Autor:
James M. Dykes, Glenn H. Chapman
Publikováno v:
SPIE Proceedings.
Under laser exposure, bimetallic thin films of Bi/In and Sn/In oxidize becoming transparent. By controlling the power, direct-write binary and grayscale photomasks have been produced with the mask's transparency (optical density, OD), ranging between
Autor:
Glenn H. Chapman, James M. Dykes
Publikováno v:
SPIE Proceedings.
Bimetallic thin films of Bi/In and Sn/In oxidize becoming transparent under laser exposure. By controlling the laser power, direct-write binary and grayscale photomasks can be produced with the mask's transparency, or optical density (OD), ranging be
Publikováno v:
Photomask Technology 2008.
Bimetallic thin-films of Bi/In act as negative thermal resists when laser exposure pulse (7mJ/sq. cm for 4 nsec) converts the film into a transparent eutectic metallic oxide alloy. Resist transparency varies with exposed laser power, changing from 60
Autor:
Hong Zhao, Glenn H. Chapman, Thomas Schneider, James M. Dykes, Urs O. Häfeli, John K. Jackson
Publikováno v:
Journal of pharmaceutical sciences. 97(11)
The present study was conducted to investigate the use of hydrodynamic flow focusing for the generation of biodegradable polymer microspheres encapsulating the anticancer drug camptothecin. Poly( D , L ‐lactide‐ co ‐glycolide) (PLGA) and poly(
Publikováno v:
SPIE Proceedings.
Novel grayscale photomasks are being developed consisting of bimetallic thin-films of Bismuth on Indium (Bi/In) and Tin on Indium (Sn/In) with optical densities (OD) ranging from ~3.0 OD to 64 gray level photomasks become possible. A particular appli
Publikováno v:
FPT
Modern FPGAs are large enough to implement multi-processor systems-on-chip (MPSoCs). Commercial FPGA companies also provide system design tools that abstract sufficient low-level system details to allow non-FPGA experts to design these systems for ne
Publikováno v:
SPIE Proceedings.
Double exposure/patterning is considered the best candidate for extending 195nm optical lithography below 40nm resolution. However, double exposure techniques require a resist where the exposures do not add linearly to produce the final result. A cla
Publikováno v:
SPIE Proceedings.
Bimetallic thin-films offer the ability of producing analog grayscale photomasks with OD ranging from ~3.0OD (unexposed) to
Autor:
Jimmy T. K. Tsui, Glenn H. Chapman, Chinheng Choo, Ash M. Parameswaren, James M. Dykes, Bonnie L. Gray, Dan Sameoto, Jun Wang, David K. Poon
Publikováno v:
Microfluidics, BioMEMS, and Medical Microsystems V.
Two methods were investigated for the creation of encapsulated micro-fluidic channels and bridges in negative tone SU-8 photoresist. The first uses two exposures at different wavelengths to create the channel sidewalls and microchannel encapsulation