Zobrazeno 1 - 2
of 2
pro vyhledávání: '"James G. Tsou"'
Autor:
John Manfredo, Charles H. Howard, Matt J. Lamantia, James G. Tsou, Jason Hickethier, Robert Kiefer, Vishal Garg, Curt Jackson, Sarah Cohen, Peter D. Buck
Publikováno v:
SPIE Proceedings.
In the recent past Deep Ultra Violet (DUV) Laser generated photomasks have gained widespread acceptance for critical and semi-critical applications in semi-conductor lithography. The advent of stable, highly capable, single-layer Chemically Amplified
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfdc73bd94cdd4ba5678467768473034
https://doi.org/10.1117/12.557720
https://doi.org/10.1117/12.557720
Autor:
Robert Kiefer, Vishal Garg, Curt Jackson, Sarah Cohen, Peter D. Buck, James G. Tsou, John Manfredo, Charles H. Howard
Publikováno v:
SPIE Proceedings.
In the recent past significant work has been done to isolate and characterize suitable single layer Chemically Amplified Resist (CAR) systems for DUV printing applicable to photomask fabrication. This work is complicated by the inherent instability o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::686d13bddb98d9abb4da297f71feb484
https://doi.org/10.1117/12.518269
https://doi.org/10.1117/12.518269