Zobrazeno 1 - 10
of 100
pro vyhledávání: '"James F. Cameron"'
Autor:
Francis McCallum, Jiacheng Zhao, Md. Daloar Hossain, Joshua A. Kaitz, James F. Cameron, Peter Trefonas, Idriss Blakey, Hui Peng, Andrew K. Whittaker
Publikováno v:
Macromolecules. 56:2651-2662
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd88ff33a0a9daa00ca4cb7f0ba799cb
https://doi.org/10.1021/acs.macromol.2c02382
https://doi.org/10.1021/acs.macromol.2c02382
Autor:
Conner Hoelzel, Li Cui, Benjamin D. Naab, Jong Keun Park, Philjae Kang, Kenneth Hernandez, Suzanne M. Coley, Stefan Alexandrescu, Rochelle Rena, James F. Cameron, Emad Aqad
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f55f4ec9150b46fb11fef1fb2f4b02b
https://doi.org/10.1117/12.2658981
https://doi.org/10.1117/12.2658981
Autor:
Francis J. McCallum, Jiacheng Zhao, Daloar Hossain, Joshua A. Kaitz, James F. Cameron, Peter Trefona, Idriss Blakey, Hui Peng, Andrew K. Whittaker
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13500fa2c3a818c5e772ed0dae74eab2
https://doi.org/10.1117/12.2655986
https://doi.org/10.1117/12.2655986
Autor:
Andrew K. Whittaker, Peter Trefonas, Francis J. McCallum, Idriss Blakey, Changkui Fu, Jiacheng Zhao, James F. Cameron, Sisi Wang, Joshua A. Kaitz, Gerald Er, Hui Peng
Publikováno v:
Macromolecules. 54:4860-4870
Photoresponsive polymers capable of luminescence switching are attracting significant interest due to their potential application in fluorescence patterning, bioimaging, optical data storage, and anti-counterfeiting. In this work, we have developed a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::309467061591253dd3066086a17e5ce8
https://doi.org/10.1021/acs.macromol.1c00297
https://doi.org/10.1021/acs.macromol.1c00297
Autor:
Francis J. McCallum, James F. Cameron, Jiacheng Zhao, Joshua A. Kaitz, Peter Trefonas, Changkui Fu, Idriss Blakey, Hui Peng, Ye Yu, Andrew K. Whittaker
Publikováno v:
Polymer Chemistry. 12:3201-3209
Photo-directed orientation control of block copolymer (BCP) domains is a powerful method for generating distinct regions of perpendicular and parallel-aligned lamella in a single film layer. In this study we demonstrate the versatility of aromatic me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66b193ada58baad6c37c0d75480894f7
https://doi.org/10.1039/d1py00501d
https://doi.org/10.1039/d1py00501d
Autor:
John B. Etienne, James W. Thackeray, James F. Cameron, P. J. Thomas, Duane R. Romer, Vipul Jain, Matthias S. Ober
Publikováno v:
Macromolecules. 52:886-895
A new class of acid labile poly(aryl acetal) polymers has been developed that can be used in photoresist formulations for next-generation microlithography techniques including extreme ultraviolet (EUV) or electron beam lithography. Example polymers h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d17c761d315b5d0fc7413423ac51fd9
https://doi.org/10.1021/acs.macromol.8b01038
https://doi.org/10.1021/acs.macromol.8b01038
Autor:
Andrew K. Whittaker, James F. Cameron, Hui Peng, Joshua A. Kaitz, Idriss Blakey, Francis J. McCallum, Peter Trefonas, Zhen Jiang, Jiacheng Zhao
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
Photo-directed orientation control of block copolymer (BCP) domains is a powerful method for generating distinct regions of perpendicular and parallel-aligned lamella in a single film layer. In this study we demonstrate the versatility of Poly(aryl m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3187e1c922e18f32c2da928542fd083f
https://doi.org/10.1117/12.2586516
https://doi.org/10.1117/12.2586516
Autor:
James F. Cameron, Sabrina Wong, Anton D. Chavez, Iou-Sheng Ke, Li Cui, Curtis Williamson, Paul J. LaBeaume, Shintaro Yamada
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
The continued miniaturization of integrated circuit features has been made possible through multilayer patterning processes where different etch steps transfer the patterned photoresist image through various hardmasks and ultimately to the underlying
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57003f2989b99b84062b17a08d398461
https://doi.org/10.1117/12.2583630
https://doi.org/10.1117/12.2583630
Autor:
Li Cui, James W. Thackeray, Suzanne Coley, Manibarsha Goswami, Bhooshan C. Popere, Emad Aqad, James F. Cameron, Tomas Marangoni, Choong Bong Lee, Ke Yang
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII.
The development of Chemically Amplified Resists (CARs) for Extreme Ultra-Violet Lithography (EUVL) requires unique molecular and macromolecular design considerations. The combination of photon-induced variation effect coupled with material and proces
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b5da3cfd949d42ba467fe982f7d533b
https://doi.org/10.1117/12.2583642
https://doi.org/10.1117/12.2583642
Autor:
Anton D. Chavez, Iou-Sheng Ke, Lei Zhang, James F. Cameron, Li Cui, Shintaro Yamada, William J. Marshall, Benjamin Foltz, Keren Zhang, Suzanne Coley, Paul J. LaBeaume
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
As the critical dimension (CD) in semiconductor devices continues to shrink, the multilayer patterning process to transfer fine line patterns into an underlying substrate is becoming increasingly important. The trilayer processes consist of a photore
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4348d04913e918b353864c3395613aa4
https://doi.org/10.1117/12.2552024
https://doi.org/10.1117/12.2552024