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pro vyhledávání: '"James D. Rockrohr"'
Autor:
James D. Rockrohr
Publikováno v:
High Speed Serdes Devices and Applications ISBN: 9780387798332
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b76cc20b69a3a49c003421d4569826a3
https://doi.org/10.1007/978-0-387-79834-9_7
https://doi.org/10.1007/978-0-387-79834-9_7
Autor:
James D. Rockrohr
Publikováno v:
High Speed Serdes Devices and Applications ISBN: 9780387798332
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8e30cdfee4048016c109c72da381153
https://doi.org/10.1007/978-0-387-79834-9_2
https://doi.org/10.1007/978-0-387-79834-9_2
Autor:
James D. Rockrohr
Publikováno v:
High Speed Serdes Devices and Applications ISBN: 9780387798332
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ed3af1371fd8684731ae58566003177
https://doi.org/10.1007/978-0-387-79834-9_3
https://doi.org/10.1007/978-0-387-79834-9_3
Autor:
James D. Rockrohr
Publikováno v:
High Speed Serdes Devices and Applications ISBN: 9780387798332
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b0df1cae76731819ed84b7b5347b53c
https://doi.org/10.1007/978-0-387-79834-9_5
https://doi.org/10.1007/978-0-387-79834-9_5
Autor:
James D. Rockrohr
Publikováno v:
High Speed Serdes Devices and Applications ISBN: 9780387798332
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a77106ba27cd0689ed1e1daf30579ec7
https://doi.org/10.1007/978-0-387-79834-9_4
https://doi.org/10.1007/978-0-387-79834-9_4
Autor:
Takeshi Yamaguchi, Werner Stickel, Hiroyasu Shimizu, Takaaki Umemoto, Hans C. Pfeiffer, J. E. Lieberman, Steven D. Golladay, Rodney A. Kendall, Muneki Hamashima, Shinichi Kojima, K. Okamoto, Michael S. Gordon, James D. Rockrohr
Publikováno v:
Emerging Lithographic Technologies VI.
The PREVAIL electron optics subsystem developed by IBM has been installed at Nikon's facility in Kumagaya, Japan, for integration into the Nikon commercial EPL stepper. The cornerstone of the electron optics design is the Curvilinear Variable Axis Le
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64c9655df0bd313ccfcd5c82e435a8ba
https://doi.org/10.1117/12.472331
https://doi.org/10.1117/12.472331
Autor:
Samuel K. Doran, J. E. Lieberman, Eileen V. Tressler, David J. Pinckney, Steven D. Golladay, Hans C. Pfeiffer, Rodney A. Kendall, R. S. Dhaliwal, Michael S. Gordon, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, R. J. Quickle
Publikováno v:
SPIE Proceedings.
The IBM/Nikon alliance is continuing pursuit of an EPL stepper alpha tool based on the PREVAIL technology. This paper provides a status report of the alliance activity with particular focus on the Electron Optical Subsystem developed at IBM. We have
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a191c525444fd471e3a2a71fb3ba3c6
https://doi.org/10.1117/12.436711
https://doi.org/10.1117/12.436711
Autor:
James D. Rockrohr, R. Butsch, Hans C. Pfeiffer, John G. Hartley, Timothy R. Groves, William A. Enichen, Michael S. Gordon
Publikováno v:
SPIE Proceedings.
IBM's latest electron beam mask maker, EL-4, is online at IBM's Advanced Mask Facility (AMF) in Essex Junction, Vermont. The EL-4 system is a 75KV shaped beam lithography system utilizing a Variable Axis Immersion Lens (VAIL) designed to produce 1X o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c96b186e923e48d03e5ea99fcd25612
https://doi.org/10.1117/12.209156
https://doi.org/10.1117/12.209156
Publikováno v:
IBM Journal of Research and Development. 26:235-241
Laser-induced arcing in cathode ray tubes has been used to study the effect of spontaneous internal high-voltage arcs under normal operating conditions. Ruby and Nd:YAG laser systems were compared as laser sources for the breakdown. Various arc-suppr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f49149a789c1ae6954d6f5aaab62022
https://doi.org/10.1147/rd.262.0235
https://doi.org/10.1147/rd.262.0235
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