Zobrazeno 1 - 2
of 2
pro vyhledávání: '"James Allen Schlueter"'
Autor:
Chen-Yuan Huang, Mark Leonard O'neill, James Allen Schlueter, Rung-Je Yang, Robert Gordon Ridgeway, Dnyanesh Chandrakant Tamboli, Ming-Shih Tsai, Lu Gan, Anupama Mallikarjunan, Achtyl Jennifer Lynn Anne, Shih-Hsuan Chao, Chris Keh-yeuan Li
Publikováno v:
ECS Journal of Solid State Science and Technology. 8:P3185-P3189
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b8a62b4cc596acd3c76019e87c1b711
https://doi.org/10.1149/2.0271905jss
https://doi.org/10.1149/2.0271905jss
Publikováno v:
ECS Transactions. 50:17-27
Currently, the manufacture of integrated circuits and fabrication of electronic devices requires the use of various types of chemical mechanical polishing compositions to selectively remove different metal, barrier, dielectric, low-k, ultra-low-k and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2ffd338b070a20c25efe40719fd4bb5
https://doi.org/10.1149/05039.0017ecst
https://doi.org/10.1149/05039.0017ecst