Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Jakob Szekeresch"'
Autor:
Uwe Dietze, Mathias Irmscher, Peter Dress, Corinna Koepernik, Jakob Szekeresch, Peter Voehringer, Fei Xu, Christian Krauss
Publikováno v:
SPIE Proceedings.
Utilizing the balance of capillary forces and adhesion, a liquid material, e.g. photo resist, can be applied to the surface of a face down mounted substrate. STEAG HamaTech's Advanced single Substrate Resist coater, ASR5000, is combining patented cap
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::876e13cb7eef36a184e94f8f6eb94692
https://doi.org/10.1117/12.467509
https://doi.org/10.1117/12.467509
Mask patterning using chemically amplified resists and the novel STEAG HamaTech Blank Coater ASR5000
Autor:
Jakob Szekeresch, Peter Dress, Christian Krauss, Reinhard Springer, Mathias Irmscher, Dietmar Mueller, Dirk Beyer, Christian Reuter, Bernd Leibold, Thomas Hoffmann, Peter Voehringer, Peter Hudek, Corinna Koepernik
Publikováno v:
SPIE Proceedings.
The new capillary spin (CAP-Spin) coating principle, realized in the STEAG HamaTech ASR5000, was evaluated for mask making using chemically amplified resists. Basic correlations between coating parameters, resist thickness and film uniformity were fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5f1e79010a31f7615f7d35a675f4f03
https://doi.org/10.1117/12.467424
https://doi.org/10.1117/12.467424
Publikováno v:
SPIE Proceedings.
A new type of bake system for photomasks, APB5000, has been developed, using a dynamic and multiple zone approach, to enable more precise Post Exposure Bake (PEB) and Post Coat Bake (PCB) of conventional and chemically amplified resists (CAR). The pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64622459bb4f1cbb797db59a691fb205
https://doi.org/10.1117/12.438353
https://doi.org/10.1117/12.438353