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pro vyhledávání: '"Jaewan Song"'
Autor:
Park Seong-Yul, Sooryong Lee, Kareem Madkour, Joe Kwan, Ho-Kyu Kang, Seung-Hune Yang, Joong-Won Jeon, SeungJo Lee, Jaewan Song, Wael ElManhawy, Jeong-Lim Kim
Publikováno v:
SPIE Proceedings.
Due to limited availability of DRC clean patterns during the process and RET recipe development, OPC recipes are not tested with high pattern coverage. Various kinds of pattern can help OPC engineer to detect sensitive patterns to lithographic effect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbe03e1331cf338d750fc4c3b7d06483
https://doi.org/10.1117/12.2257830
https://doi.org/10.1117/12.2257830
