Zobrazeno 1 - 10
of 30
pro vyhledávání: '"Jaeheon Shin"'
Autor:
Byung-Tai Kim, Jaeheon Shin
Publikováno v:
Current Applied Physics.
Autor:
Jung-Hyung Kim, Jaeheon Shin, Yeong-Shin Kim, Chan-Hwa Hong, Shin-Jae You, Nae-Man Park, Kyung-Hyun Kim, Woo-Seok Cheong
Publikováno v:
Surface and Coatings Technology. 266:10-13
Indium-tin oxide (ITO) films were successfully grown at low temperatures by ionized physical vapor deposition (IPVD) method, equipped with an internal-type inductively coupled plasma reactor (ICP-reactor). Radio-frequency antenna for ICP was made by
Autor:
Sung Mook Chung, Seung Jae Lee, Seung-Youl Kang, Young Jin Kim, Kyoung Ik Cho, Woo-Seok Cheong, Chi-Sun Hwang, Jaeheon Shin
Publikováno v:
Journal of Crystal Growth. 326:94-97
The effects of zinc on the zinc-doped CaTiO 3 :Pr 3+ phosphors have been investigated by varying the zinc concentrations from 0 to 100 mol%. The variation of zinc concentration influences the crystallinity and morphology of the phosphors. The crystal
Publikováno v:
Thin Solid Films. 517:4094-4099
Indium–tin oxide (ITO) has been widely used as electrodes for LCDs and OLEDs. The applications are expanding to the transparent thin-film transistors (TTFT S ) for the versatile circuits or transparent displays. This paper is related with optimizat
Autor:
Min-Ki Ryu, Min Suk Oh, Jaeheon Shin, Seongil Im, Kimoon Lee, Sang-Hee Ko Park, Shinhyuk Yang, Chun-Won Byun, Jeong Lk Lee, Chi-Sun Hwang
Publikováno v:
Advanced Materials. 21:678-682
Autor:
Cheol Seong Hwang, Shin Hyuk Yang, Min Ki Ryu, Doohyung Cho, Chun-Won Byun, Jeong-Ik Lee, Hye-Yong Chu, Jaeheon Shin
Publikováno v:
Journal of the Korean Physical Society. 54:531-534
We have studied transparent bottom-gate TFTs (thin film transistors) using amorphous IGZO (In-Ga-Zn-O) as an active channel material. The TFT devices had inverse co-planar structures. Source/drain and gate electrodes were constituted by ITO sputtered
Publikováno v:
Thin Solid Films. 516:8159-8164
We have investigated transparent thin-film transistors (TTFTs) with active channel of zinc oxide (ZnO) films, reactively grown by RF magnetron sputtering using metallic zinc target. According to the ratio of oxygen to the total gas (O 2 /(O 2 + Ar)),
Autor:
Jae-Hong Jeon, Jong-Hyun Seo, Kang-Woong Lee, Jaeheon Shin, Chi-Sun Hwang, HeeHwan Choe, Sang-Hee Ko Park
Publikováno v:
Journal of the Korean Physical Society. 53:412-415
Publikováno v:
Electronic Materials Letters. 9:467-469
A transparent non-volatile memory device was fabricated using silicon quantum dots in silicon nitride film as a gate insulator. A silicon quantum dots were grown in-situ in the film by plasma-enhanced chemical vapor deposition. The silicon quantum do
Publikováno v:
Thin Solid Films. 520:3800-3802
We demonstrate that the voltage-dependent average mobility of In–Ga–Zn–O (IGZO) thin-film transistors (TFTs) can be excellently fitted by an empirical mobility function based on the exponential density of deep and tail states. The proposed mobi