Zobrazeno 1 - 10
of 105
pro vyhledávání: '"Jae Won Hahn"'
Publikováno v:
Advanced Photonics Research, Vol 4, Iss 4, Pp n/a-n/a (2023)
Current research on multispectral stealth material technology focuses on practical functionalities such as optical transparency, flexibility, and lightweight. Herein, an optically transparent and single‐layer frequency‐selective surface (OTSF) ab
Externí odkaz:
https://doaj.org/article/5ff0cc60c7464c4e8b115638393601f6
Publikováno v:
Advanced Photonics Research. 4
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b9bf57df994ca618ac3cc27f32eed80
https://doi.org/10.1002/adpr.202200009
https://doi.org/10.1002/adpr.202200009
Publikováno v:
ACS applied materialsinterfaces. 12(38)
Selective emitters comprising plasmonic resonators have been exploited for cooling devices or infrared stealth technology. While selective emitters have been designed using odd-order resonances, even-order resonances also emit anisotropic thermal rad
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5f0c3f1cd1fe8265e96d77bb0e1f6913
https://pubmed.ncbi.nlm.nih.gov/32862637
https://pubmed.ncbi.nlm.nih.gov/32862637
Publikováno v:
Propellants, Explosives, Pyrotechnics. 42:558-565
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31805f227362c59a4e70e521672c951e
https://doi.org/10.1002/prep.201600199
https://doi.org/10.1002/prep.201600199
Publikováno v:
International Journal of Precision Engineering and Manufacturing. 16:1919-1924
We measure the density of atomic chlorine radicals in inductive coupled plasma (ICP) with an optical emission spectrometer (OES). Our results revealed a transition point in the dissociation rate of molecular chlorine with respect to radio frequency (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::32555ce4144bb8798f318520a7f01afe
https://doi.org/10.1007/s12541-015-0249-0
https://doi.org/10.1007/s12541-015-0249-0
Publikováno v:
International Journal of Precision Engineering and Manufacturing. 16:373-378
In this paper we address keystone error, a significant parameter when diagnosing the misalignment of projection optics in maskless lithography systems. Tilting of either the object or image planes of an optical system results in keystone error. In th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a620bd118bd97b3876bfcc2a96b824fd
https://doi.org/10.1007/s12541-015-0049-6
https://doi.org/10.1007/s12541-015-0049-6
Publikováno v:
International Journal of Aeronautical and Space Sciences. 13:386-397
The stability and structure of bluff-body stabilized hydrogen flames were investigated numerically and experimentally. The velocity of coflowing air was varied from subsonic velocity to a supersonic velocity of Mach 1.8. OH PLIF images and Schlieren
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::654b98ab2837e698ce46110f8a558116
https://doi.org/10.5139/ijass.2012.13.3.386
https://doi.org/10.5139/ijass.2012.13.3.386
Publikováno v:
International Journal of Precision Engineering and Manufacturing. 12:877-883
Modern laser direct writing techniques provide tools for high-precision fabrication and manufacturing at the micro scale. As the integration of devices increases, the feature size is being reduced to the nanometer scale. In this paper, we developed a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd55faef1cf93bb8df7770e783633ca6
https://doi.org/10.1007/s12541-011-0117-5
https://doi.org/10.1007/s12541-011-0117-5
Publikováno v:
Scanning. 33:99-105
Summary: Plasmonic lithography with a contact probe records nano-meter scale features and has high-throughput owing to its capability to scan in contact mode. The probe is commonly based on a micrometer-scale cantilever, which leads to the tippositio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d02010e4484641274593e075c9528576
https://doi.org/10.1002/sca.20228
https://doi.org/10.1002/sca.20228
Publikováno v:
Korean Journal of Optics and Photonics. 21:241-246
In this paper, we propose an electric field enhanced postexposure baking (EFE-PEB) method to obtain deep and high aspect ratio pattern profile in near-field recording. To describe the photoacid distribution under an external electric field during the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4eb40d2f2b22be045af65f0f251a2da
https://doi.org/10.3807/kjop.2010.21.6.241
https://doi.org/10.3807/kjop.2010.21.6.241