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pro vyhledávání: '"Jae Hyoung Youn"'
Publikováno v:
Solar Energy Materials and Solar Cells. 69:139-145
We studied the deposition of polycrystalline silicon (poly-Si) using SiH4/SiH2Cl2/H2 mixtures by inductively coupled plasma chemical vapor deposition. The deposition rate and crystalline quality were improved by increasing RF power. The poly-Si film
Publikováno v:
MRS Proceedings. 685
Polycrystalline silicon thin films have been deposited by an inductively coupled plasma chemical vapor deposition using SiH4/H2 mixtures. The quality of poly-Si can be improved by increasing RF power and hydrogen dilution ratio. The poly-Si deposited
Publikováno v:
Solar Energy Materials & Solar Cells. Sep2001, Vol. 69 Issue 2, p1. 1p.