Zobrazeno 1 - 10
of 32
pro vyhledávání: '"Jae Hwan Sim"'
Publikováno v:
Korean Journal of Anesthesiology, Vol 67, Iss 1, Pp 8-12 (2014)
BackgroundDexmedetomidine is a useful sedative drug with various uses. We designed this study to investigate the clinical effects and complications of different loading doses, 0.5 and 1.0 µg/kg.MethodsForty six patients, of American Society of Anest
Externí odkaz:
https://doaj.org/article/1e30f9f3bd984630a9f07f58a5a0e229
Publikováno v:
Korean Journal of Anesthesiology, Vol 63, Iss 2, Pp 157-160 (2012)
Every operation could have a fire emergency, especially in the case of a tracheostomy. When a flammable gas meets a source of heat, the danger of fire is remarkable. A tracheal tube filled with a high concentration of oxygen is also a great risk fact
Externí odkaz:
https://doaj.org/article/d180a5fbbdc84d49b682a3317f4df789
Publikováno v:
Korean Journal of Anesthesiology, Vol 61, Iss 5, Pp 413-418 (2011)
BackgroundThe transversus abdominis plane block is recently described peripheral block to providing analgesia to the anterior abdominal wall. The goal of this study is to evaluate the analgesic efficacy of the ultrasound-guided transversus abdominis
Externí odkaz:
https://doaj.org/article/f8353ed049d4426bafd4c06e348b63c0
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Jae Hwan Sim, Yoo-Jin Ghang, Jung-June Lee, Jae Yun Ahn, Jae-Bong Lim, Joo Sung Lee, Min Young Jeong, Soojung Leem, Youngeun Bae, Yinjie Cen, James R. Marsh, Lei Zhang
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Publikováno v:
Korean Academy of Addiction Psychiatry. 25:9-17
Publikováno v:
Journal of Photopolymer Science and Technology. 32:435-439
Publikováno v:
Journal of Photopolymer Science and Technology. 31:541-545
Publikováno v:
Korean Journal of Chemical Engineering. 34:1495-1499
Polydimethylsiloxane (PDMS) microfluidic devices, though they are commonly utilized in microfluidic applications, have several limitations, such as short-term modified surface condition, swelling in the presence of organic solvents, and deformation u
Autor:
Sung-Il Lee, Hyun-Mi Kim, Christopher L. Soles, Hae-Jeong Lee, Jae Hwan Sim, Ki-Bum Kim, Richard Kasica, Do Y. Yoon
Publikováno v:
Applied Organometallic Chemistry. 27:644-651
Hydrogen silsesquioxane (HSQ) is an attractive electron-beam (e-beam) resist for sub-20 nm lithography owing to its high resolution, excellent line-edge roughness (LER) and good plasma etch resistance. However, the sensitivity and long-term stability