Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Jad Jaber"'
Publikováno v:
International Journal of Contemporary Management. 59:17-32
Purpose Agricultural technologies (agri-techs) have focused on developing the AI perspective of human-AI interaction rather than human perceptions and responses. A lack of understanding of their employees’ behavioral responses when interacting with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6444c3c59642edbbc21e275f12534928
https://doi.org/10.2478/ijcm-2023-0003
https://doi.org/10.2478/ijcm-2023-0003
Publikováno v:
Information Resources Management Journal. 35:1-21
The metaverse is emerging as a novel research frontier and a breakthrough technology across numerous markets and industries. Yet, due to its novelty, we know little about the users' behavioral responses toward such a disruptive innovation. Through th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7afa43a41cc199e9db0d321624b188b8
https://doi.org/10.4018/irmj.314575
https://doi.org/10.4018/irmj.314575
Autor:
Jad Jaber, Helmi Issa
Publikováno v:
Information Resources Management Journal. 35:1-23
Rising stress levels in high-tech organizations have currently reached their highest peak. The dearth of empirical studies that focus on investigating the concept of technostress within FinTechs motivated this paper to address urgent research calls.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d988ff389f65a5595085d4f7f2929179
https://doi.org/10.4018/irmj.314576
https://doi.org/10.4018/irmj.314576
Autor:
Jad Jaber, Helmi Issa
Publikováno v:
International Journal of Technology and Human Interaction. 18:1-21
Building on prior suggestions concerning corporate resources as causes of disruptive innovation for increasing competitive advantage in developed economies, this research empirically re-investigated such assumptions in emerging markets. Through the t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fed9c5ae59757e488ba1afc0624738bb
https://doi.org/10.4018/ijthi.299069
https://doi.org/10.4018/ijthi.299069
Autor:
V. Bianchi, Giulio Jad Jaber, Corrado Chiappa, Valentina De Berardinis, Alice Bonetti, Francesca Rovera
Publikováno v:
Cancers
Volume 13
Issue 3
Cancers, Vol 13, Iss 431, p 431 (2021)
Volume 13
Issue 3
Cancers, Vol 13, Iss 431, p 431 (2021)
Introduction: Ductal carcinoma in situ (DCIS) is an intraductal neoplastic proliferation of epithelial cells that are confined within the basement membrane of the breast ductal system. This retrospective observational analysis aims at reviewing the i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e8741e0911d66b104be7f93c13198dcd
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Metal contaminants are notorious yield detractors throughout semiconductor unit processes. Metallic contaminants can create small, hard-to-detect defects that can eventually result in cone defects and gate leakage. Because these contaminants are so h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a1cc598206c323e8627f39d252eaed5
https://doi.org/10.1117/12.2551646
https://doi.org/10.1117/12.2551646
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
ArF lithography is the primary technique used in leading edge semiconductor fabrication. However, as lithographers attempt to create manufacturable processes for N7 and future nodes, they are challenged to achieve improvements in cost of ownership an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::581be082a2cc0530135e95bb15bf64c0
https://doi.org/10.1117/12.2514974
https://doi.org/10.1117/12.2514974
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
Continued momentum in the development of EUV photolithography toward high volume manufacturing has driven the evolution of increased photoresist purity requirements. Further scaling will intensify the challenge to improve inline yield and reliability
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::42bb906ccd21ac0a5619728bf3ccc546
https://doi.org/10.1117/12.2514969
https://doi.org/10.1117/12.2514969
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
Metal ions in photoresists and solvents pose an ever greater contamination problem in photolithography’s advanced applications. The reduction of metal contaminants is critical in the entire photochemical supply chain. In this paper we demonstrate t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dd24a721a7dac563d117bb3fe4a0673
https://doi.org/10.1117/12.2297395
https://doi.org/10.1117/12.2297395
Autor:
Hareen Bayana, Lucia D'Urzo, Philippe Foubert, Jad Jaber, Aiwen Wu, James Hamzik, Jelle Vandereyken
Publikováno v:
SPIE Proceedings.
Specific “killer-defects”, such as micro-line-bridges are one of the key challenges in photolithography’s advanced applications, such as multi-pattern. These defects generate from several sources and are very difficult to eliminate. Pointof-use
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ede1c97998759c9a0052427cd72deee
https://doi.org/10.1117/12.2258582
https://doi.org/10.1117/12.2258582