Zobrazeno 1 - 10
of 69
pro vyhledávání: '"Jacky Huang"'
Autor:
Jacky Huang, 黃仕澔
98
In this dissertation, the author used commercial process simulators, including ANSYS and Sentaurus/SPROCESS to study stress distributions in the strained silicon (Si) channel regions of silicon-carbon alloy source/drain and stressed silicon n
In this dissertation, the author used commercial process simulators, including ANSYS and Sentaurus/SPROCESS to study stress distributions in the strained silicon (Si) channel regions of silicon-carbon alloy source/drain and stressed silicon n
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/27614772544529641012
Publikováno v:
ACS Omega, Vol 5, Iss 13, Pp 7537-7544 (2020)
Externí odkaz:
https://doaj.org/article/cb2577efbe8e456989a1ae3078c6a4a6
Publikováno v:
2022 China Semiconductor Technology International Conference (CSTIC).
Publikováno v:
In Chemical Engineering Science 2010 65(6):1964-1975
Publikováno v:
2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
In this paper, a 5 nm FinFET flow was built using the SEMulator3D® virtual fabrication platform. Different STI (shallow trench isolation) recess profiles were investigated using the pattern-dependent etch capabilities of SEMulator3D, including chang
Publikováno v:
Journal of Clinical Oncology. 40:2054-2054
2054 Background: Deep learning algorithms trained to segment brain tumors from magnetic resonance imaging (MRI) perform well in ideal conditions supplied by curated datasets. An example is the MICCAI BraTS 2018 dataset, which provides a set of four M
Publikováno v:
2021 China Semiconductor Technology International Conference (CSTIC).
In this paper, we study the effect of poly corner residue during a 5nm FinFET poly etch process using virtual fabrication. A systemic investigation was performed to understand the impact of poly corner residue on hard failure modes and device perform
Autor:
A. Nannipieri, Munkang Choi, P. Asenov, D. Sherlekar, Jaehyun Lee, L. S. Melvin, L. Sponton, Binjie Cheng, S. Jones, X-W. Lin, Victor Moroz, Jacky Huang
Publikováno v:
2020 IEEE International Electron Devices Meeting (IEDM).
Instead of marching from one crisply defined technology node to the next with an uncertain timeline, industry is transitioning toward annual technology updates driven by a schedule, but with an uncertain transistor density increase. Full node updates
Publikováno v:
PLoS ONE, Vol 8, Iss 2, p e57050 (2013)
Prevention of the initiation of biofilm formation is the most important step for combating biofilm-associated pathogens, as the ability of pathogens to resist antibiotics is enhanced 10 to 1000 times once biofilms are formed. Genes essential to bacte
Externí odkaz:
https://doaj.org/article/bda63e22537344b9833253b17d12506a