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Autor:
Luigi Scaccabarozzi, Wim van der Zande, Maurice Bogers, Laurens de Winter, Erik Ruinemans, Rob van Gils, Derk Brouns, Hans Vermeulen, Florian Didier Albin Dhalluin, Daniel Smith, Juan Diego Arias Espinoza, Maria Peter, Sven Lentzen, Jack Van der Sanden
Publikováno v:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.
EUV pellicle membranes are being pursued to protect scanner images from repeating defects caused by reticle fall-on particle defects. Because most materials highly absorb EUV, pellicle membranes must be ultrathin. In an attempt to increase the streng
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::050ffb75c25838090c8bccbe68c00d72
https://doi.org/10.1117/12.2197454
https://doi.org/10.1117/12.2197454
