Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jack L. Ebel"'
Autor:
Cari F. Herrmann, Jack L. Ebel, Victor M. Bright, Steven M. George, R. Cortez, Kevin D. Leedy, David C. Miller, Frank W. DelRio, Richard E. Strawser
Publikováno v:
Sensors and Actuators A: Physical. 135:262-272
Atomic layer deposition (ALD) was used to deposit an alternative dielectric barrier layer for use in radio frequency microelectromechanical systems (rf MEMS). The layer is an alloy mixture of Al2O3 and ZnO and is proposed for use as charge dissipativ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d872d6eec81180bf2d373ac236c6f616
https://doi.org/10.1016/j.sna.2006.07.002
https://doi.org/10.1016/j.sna.2006.07.002
Autor:
H. S. Newman, Rita Mahon, David J. McGee, William S. Rabinovich, Todd H. Stievater, Peter G. Goetz, Jack L. Ebel
Publikováno v:
SPIE Proceedings.
We report absolute measurements of thermal-mechanical noise in microelectromechanical systems. The measurements are made possible with a simple, high resolution optical technique that has a displacement resolution on the order of hundreds of femtomet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a07f95e829d4eec6870aa0f086784625
https://doi.org/10.1117/12.472753
https://doi.org/10.1117/12.472753