Zobrazeno 1 - 1
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pro vyhledávání: '"Jack Chao-Hsu Chang"'
Publikováno v:
SPIE Proceedings.
Hardmask processes are a key technique to enable low-k semiconductors, but they can have an impact on patterning control, influencing defectivity, alignment, and overlay. Specifically, amorphous carbon layer (ACL) hardmask schemes can negatively affe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f2ff548410a3c7aba1eb316475e7acd
https://doi.org/10.1117/12.2258099
https://doi.org/10.1117/12.2258099
