Zobrazeno 1 - 10
of 179
pro vyhledávání: '"Jaan Aarik"'
Autor:
Aile Tamm, Kristjan Kalam, Helina Seemen, Jekaterina Kozlova, Kaupo Kukli, Jaan Aarik, Joosep Link, Raivo Stern, Salvador Dueñas, Helena Castán
Publikováno v:
ACS Omega, Vol 2, Iss 12, Pp 8836-8842 (2017)
Externí odkaz:
https://doaj.org/article/8375e7d705c148aa8f722cb13e67574c
Publikováno v:
Crystal Growth & Design. 23:548-557
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99913390e750c3e0e990fbd59bf4794c
https://doi.org/10.1021/acs.cgd.2c01174
https://doi.org/10.1021/acs.cgd.2c01174
Publikováno v:
Crystal Growth & Design. 21:4220-4229
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c772d171773fcd5b5b46e1a426215528
https://doi.org/10.1021/acs.cgd.1c00471
https://doi.org/10.1021/acs.cgd.1c00471
Autor:
Kaupo Kukli, Lauri Aarik, Guillermo Vinuesa, Salvador Dueñas, Helena Castán, Héctor García, Aarne Kasikov, Peeter Ritslaid, Helle-Mai Piirsoo, Jaan Aarik
Publikováno v:
Materials; Volume 15; Issue 3; Pages: 877
Materials, Vol 15, Iss 877, p 877 (2022)
Materials, Vol 15, Iss 877, p 877 (2022)
Crystal structure and electrical properties of hafnium-praseodymium oxide thin films grown by atomic layer deposition on ruthenium substrate electrodes were characterized and compared with those of undoped HfO2 films. The HfO2 reference films crystal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::98a7d6a28e3c9f716ab1e925a68620aa
Publikováno v:
SSRN Electronic Journal.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e8b508f19adaf045305722cdb57a6c76
https://doi.org/10.2139/ssrn.4309699
https://doi.org/10.2139/ssrn.4309699
Autor:
Aivar Tarre, Hugo Mändar, Lauri Aarik, Kristel Möls, Jaan Aarik, Aarne Kasikov, Taivo Jõgiaas
Publikováno v:
Coatings, Vol 11, Iss 1280, p 1280 (2021)
Coatings
Volume 11
Issue 11
Coatings
Volume 11
Issue 11
High-density phases of TiO2, such as rutile and high-pressure TiO2-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO2-II with anatase and rutile have been considered promisin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bcb384d55be08ac1b63b5ef3fae1b90f
https://www.mdpi.com/2079-6412/11/11/1280
https://www.mdpi.com/2079-6412/11/11/1280
Publikováno v:
Materials Chemistry and Physics. 228:285-292
Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings deposited in TiCl4 O3 and AlCl3 O3 atomic layer deposition processes on Si(100) and AISI 310 stainless steel was studied. Etching of coatings in hot sulfuric acid revealed mar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::882f84d6d7ab62fb1832705c329b57b0
https://doi.org/10.1016/j.matchemphys.2019.02.053
https://doi.org/10.1016/j.matchemphys.2019.02.053
Autor:
Joonas Merisalu, Tõnis Arroval, Aarne Kasikov, Jekaterina Kozlova, Mihkel Rähn, Peeter Ritslaid, Jaan Aarik, Aile Tamm, Kaupo Kukli
Publikováno v:
Materials Science and Engineering: B. 282:115797
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e9e06e7bf944d1a7a6ace336f568de4
https://doi.org/10.1016/j.mseb.2022.115797
https://doi.org/10.1016/j.mseb.2022.115797
Publikováno v:
Surface and Coatings Technology. 438:128409
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbaae3eafa2135a02887032895a5d814
https://doi.org/10.1016/j.surfcoat.2022.128409
https://doi.org/10.1016/j.surfcoat.2022.128409
Autor:
Ilmo Sildos, Arvo Kikas, Karmo Peetermann, Lauri Aarik, Jaan Aarik, Hugo Mändar, Laurits Puust
Publikováno v:
Journal of Alloys and Compounds. 868:159100
Atomic layer deposition of praseodymium oxide (PrOx) films from Pr(thd)3 and O3 as precursors that yielded binary films with non-uniform thicknesses was shown to allow Pr-doping HfO2 films with uniform dopant distributions in the surface plane. The u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::783d5d37624bfb1ba49e98fb35fcce77
https://doi.org/10.1016/j.jallcom.2021.159100
https://doi.org/10.1016/j.jallcom.2021.159100