Zobrazeno 1 - 10
of 46
pro vyhledávání: '"Jaakko Julin"'
Autor:
Yi-Teng Huang, Seán R. Kavanagh, Marcello Righetto, Marin Rusu, Igal Levine, Thomas Unold, Szymon J. Zelewski, Alexander J. Sneyd, Kaiwen Zhang, Linjie Dai, Andrew J. Britton, Junzhi Ye, Jaakko Julin, Mari Napari, Zhilong Zhang, James Xiao, Mikko Laitinen, Laura Torrente-Murciano, Samuel D. Stranks, Akshay Rao, Laura M. Herz, David O. Scanlon, Aron Walsh, Robert L. Z. Hoye
Publikováno v:
Nature Communications, Vol 13, Iss 1, Pp 1-13 (2022)
Ternary chalcogenides are gaining interest as nontoxic, stable solar absorbers. Here, the authors investigate NaBiS2, finding cation disorder to be a critical parameter that enables its high absorption strength and unusual charge-carrier kinetics.
Externí odkaz:
https://doaj.org/article/ed96a07e628742a5bca386c73c53182b
Publikováno v:
Materials, Vol 14, Iss 20, p 5966 (2021)
Atomic layer deposition (ALD) technology has unlocked new ways of manipulating the growth of inorganic materials. The fine control at the atomic level allowed by ALD technology creates the perfect conditions for the inclusion of new cationic or anion
Externí odkaz:
https://doaj.org/article/07b5f8934ad94c2bba2581536f1d79b8
Autor:
Martin Rosenthal, Jaakko Julin, Rostislav Daniel, Christian Mitterer, Stefan Spor, Farwah Nahif, Nikolaus Jäger, Michael Meindlhumer, Hynek Hruby, Jozef Keckes, Michal Zítek
Publikováno v:
'Journal of Materials Science & Technology ', vol: 100, pages: 91-100 (2022)
The resistance of wear protective coatings against oxidation is crucial for their use at high temperatures. Here, three nanocomposite AlCr(Si)N coatings with a fixed Al/Cr atomic ratio of 70/30 and a varying Si-content of 0 at.%, 2.5 at.% and 5 at.%
Autor:
Ramin, Ghiyasi, Anish, Philip, Ji, Liu, Jaakko, Julin, Timo, Sajavaara, Michael, Nolan, Maarit, Karppinen
Publikováno v:
Chemistry of materials : a publication of the American Chemical Society. 34(11)
We present a new type of atomic layer deposition (ALD) process for intermetallic thin films, where diethyl zinc (DEZ) serves as a coreactant. In our proof-of-concept study, FeCl
Publikováno v:
IEEE Journal of Photovoltaics. 10:959-968
Silicon surface passivation by gallium oxide (Ga2O3) thin films deposited by thermal- and plasma-enhanced atomic layer deposition (ALD) over a broad temperature range from 75 °C to 350 °C is investigated. In addition, the role of oxidant (O3 or O-p
Autor:
David Rafaja, Frans Munnik, Sibylle Gemming, Jörg Grenzer, Matthias Krause, Christina Wüstefeld, Jaakko Julin, René Hübner, Daniel Janke
Publikováno v:
Carbon. 159:656-667
In thin amorphous carbon (a-C) films being in contact with a thin nickel layer, metal-induced crystallization and layer exchange (LE) occur at temperatures lower than 700 °C. Analysis of thin film stacks with different architectures (a-C/Ni, Ni/a-C
Publikováno v:
The Journal of Physical Chemistry C. 124:8616-8623
Lithium–silicon compounds are used as active material in the negative electrodes of Li-ion batteries. The knowledge of Li diffusion in these materials is of importance for the optimization of charg...
Autor:
Andreas Stark, Rostislav Daniel, Julius Keckes, Michael Meindlhumer, Hynek Hruby, Nikolaus Jäger, Jaakko Julin, S. Spor, F. Nahif, Christian Mitterer
Publikováno v:
Acta Materialia 186(2020), 545-554
Jäger, N.; Meindlhumer, M.; Spor, S.; Hruby, H.; Julin, J.; Stark, A.; Nahif, F.; Keckes, J.; Mitterer, C.; Daniel, R.: Microstructural evolution and thermal stability of AlCr(Si)N hard coatings revealed by in-situ high-temperature high-energy grazing incidence transmission X-ray diffraction. In: Acta Materialia. Vol. 186 (2020) 545-554. (DOI: /10.1016/j.actamat.2020.01.026)
Jäger, N.; Meindlhumer, M.; Spor, S.; Hruby, H.; Julin, J.; Stark, A.; Nahif, F.; Keckes, J.; Mitterer, C.; Daniel, R.: Microstructural evolution and thermal stability of AlCr(Si)N hard coatings revealed by in-situ high-temperature high-energy grazing incidence transmission X-ray diffraction. In: Acta Materialia. Vol. 186 (2020) 545-554. (DOI: /10.1016/j.actamat.2020.01.026)
An extensive understanding about the microstructural evolution and thermal stability of the metastable AlCr(Si)N coating system is of considerable importance for applications facing high temperatures, but it is also a challenging task since several s
Autor:
Michael Tkadletz, Nina Schalk, Alexandra Lechner, Lukas Hatzenbichler, David Holec, Christina Hofer, Marco Deluca, Bernhard Sartory, Andrey Lyapin, Jaakko Julin, Christoph Czettl
Within this work the effect of the B content on the microstructure, phase composition and mechanical properties of CVD Ti(B,N) coatings is investigated. Ti(B,N) coatings with B contents from 0 (fcc-TiN) to ∼5, ∼15, ∼30, ∼45 and 66 (h-TiB2) at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d6267e5d294cc37e0da415f5f1b11fe5
http://urn.fi/URN:NBN:fi:jyu-202202171538
http://urn.fi/URN:NBN:fi:jyu-202202171538
Autor:
Andreas Langner, Kai Arstila, Oili Ylivaara, Saima Ali, Harri Lipsanen, Jaakko Julin, Simo-Pekka Hannula, Riikka L. Puurunen, Xuwen Liu, Sakari Sintonen, Dieter Schneider, Timo Sajavaara
Publikováno v:
Ylivaara, O M E, Langner, A, Liu, X, Schneider, D, Julin, J, Arstila, K, Sintonen, S, Ali, S, Lipsanen, H, Sajavaara, T, Hannula, S & Puurunen, R L 2021, ' Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition ', Thin Solid Films, vol. 732, 138758 . https://doi.org/10.1016/j.tsf.2021.138758
Funding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220) and Nuclear and Accelerator Based Physics (refs.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d16b8a7cdc86b3708204f053ea0f745
https://aaltodoc.aalto.fi/handle/123456789/108651
https://aaltodoc.aalto.fi/handle/123456789/108651