Zobrazeno 1 - 10
of 15
pro vyhledávání: '"JEN-JIANG LEE"'
Autor:
Yung-Sheng Lin, Tsung-Cheng Chen, Jung-Ching Wang, Chen Shian-Wen, Chen-Hao Ku, Jui-Yi Hung, Ching-Chang Wen, Jen-Jiang Lee
Publikováno v:
2014 IEEE 40th Photovoltaic Specialist Conference (PVSC).
AlO x provides excellent passivation on p-type silicon surface and has successfully implemented to high efficiency Passvated Emitter and Rear Cell (PERC) solar cells in recent years. Generally, AlO x is deposited by using plasma enhanced chemical vap
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d33d2eb38b077c837b988bb277fce5f5
https://doi.org/10.1109/pvsc.2014.6924997
https://doi.org/10.1109/pvsc.2014.6924997
Autor:
David W. Gidley, Jim Connor, E. Todd Ryan, Todd Guenther, Lynne Svedberg, Melissa Freeman, Jianing Sun, Katie Yu, Jen-Jiang Lee
Publikováno v:
MRS Proceedings. 766
The compatibility of ALD and CVD metal deposition with mesoporous and microporous carbon-doped organosilicate glass (OSG) films was examined. Blanket film studies using TEM, TOF-SIMS, and positron lifetime spectroscopy demonstrate that ALD Wand TaN p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28ab0358e5aa80b81cee378684e8f5a7
https://doi.org/10.1557/proc-766-e10.8
https://doi.org/10.1557/proc-766-e10.8
Autor:
Scott Daniel Hector, S. Dakshina-Murthy, Will Conley, Wei Wu, Jen-Jiang Lee, Todd Guenther, Tom Lii, Jonathan L. Cobb, F. Huang, Saifi Usmani, Colita Parker
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography (EUVL), and possibly 157-nm lithography, will require thin imaging layers (< 1500 A). Theleading EUV resist strategy utilizes thin resists based on materials designed for 248 nm wavelength exposure and hardmasks.This p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4517031a1e6be2101d2309b8b941b3d
https://doi.org/10.1117/12.436856
https://doi.org/10.1117/12.436856
Autor:
Jen Jiang Lee, Gerald G. Fuller
Publikováno v:
Macromolecules. 17:375-380
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff36d1c899e1a3f3c271b95339f488f6
https://doi.org/10.1021/ma00133a021
https://doi.org/10.1021/ma00133a021
Publikováno v:
Journal of The Electrochemical Society. 135:711-714
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95ca00a133e5069d9347d2c890ed3655
https://doi.org/10.1149/1.2095728
https://doi.org/10.1149/1.2095728
Autor:
Gerald G. Fuller, Jen-Jiang Lee
Publikováno v:
Journal of Colloid and Interface Science. 107:308-313
In this paper the bead and spring model of a polymer chain adsorbed onto a solid boundary in the presence of flow is extended to include the effects of hydrodynamic interactions between the polymer segments and the solid surface. In addition, the con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ca67999074e69c069323d1edcea851a7
https://doi.org/10.1016/0021-9797(85)90182-1
https://doi.org/10.1016/0021-9797(85)90182-1
Autor:
Gerald G. Fuller, Jen-Jiang Lee
Publikováno v:
Journal of Colloid and Interface Science. 103:569-577
Ellipsometry has been applied to the study of adsorption and desorption of flexible polymer chains in flowing systems. This optical technique produces a measurement of both film thickness and adsorbance under velocity gradients up to 7800 sec −1 .
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8394cad366baef1020c09ae4305c73e6
https://doi.org/10.1016/0021-9797(85)90132-8
https://doi.org/10.1016/0021-9797(85)90132-8
Publikováno v:
Journal of The Electrochemical Society. 135:2111-2113
X-ray fluorescence (XRF) has received a great deal of attention in the last few years as a quantitative means of determining both the stoichiometry and thickness of many different kinds of films. Examples include Ag and Cu films on mica substrates, S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d3d72a84cdcb8e141120af99e01e472b
https://doi.org/10.1149/1.2096222
https://doi.org/10.1149/1.2096222
Autor:
GERALD G. FULLER, JEN-JIANG LEE
Publikováno v:
ACS Symposium Series ISBN: 9780841208209
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c930e5892191980c80171beb70309fe4
https://doi.org/10.1021/bk-1984-0240.ch005
https://doi.org/10.1021/bk-1984-0240.ch005
Publikováno v:
Advances in Resist Technology and Processing VI.
Fourier transform infrared (FUR) spectroscopy was used to study the effects of various resist process variables on the photospeed. Resist components which are responsible for photospeed changes were identified. The doublet peak around 2100 cm -1 , wh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c02251b578ee13c8174f9f9af3a90f23
https://doi.org/10.1117/12.953045
https://doi.org/10.1117/12.953045