Zobrazeno 1 - 10
of 261
pro vyhledávání: '"J.P. Sénateur"'
Publikováno v:
Applied Physics A. 79:1979-1984
Liquid-injection MOCVD was successfully applied to the growth of La1-xMnO3-δfilms. A structural study by means of X-ray diffraction and transmission electron microscopy was performed on lanthanum manganite films grown under different (P[O2]–T) con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::89d9f23e43e0ff42b1d475e4ef8e3e7a
https://doi.org/10.1007/s00339-003-2179-4
https://doi.org/10.1007/s00339-003-2179-4
Autor:
Carmen Jiménez, Q. Fang, Paul K. Hurley, J.-Y. Zhang, J.X. Wu, Barry O'Sullivan, Zhongping Wang, M.A. Audier, T.L. Leedham, Ian W. Boyd, J.P. Sénateur, Hywel O. Davies
Publikováno v:
Thin Solid Films. 428:248-252
In previous work, we have grown 4–10 nm Ta 2 O 5 films by photo-induced chemical vapour deposition (photo-CVD) using a special precursor injection system, which exhibited leakage currents as low as 2.19×10 −7 A/cm 2 at 1 MV/cm. However propertie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d3507e09225621a826c44c50baa32c93
https://doi.org/10.1016/s0040-6090(02)01280-4
https://doi.org/10.1016/s0040-6090(02)01280-4
Autor:
J.X. Wu, Carmen Jiménez, Hywel O. Davies, Barry O'Sullivan, Ian W. Boyd, J.-Y. Zhang, Zhongping Wang, Q. Fang, M.A. Audier, T.L. Leedham, J.P. Sénateur, Paul K. Hurley
Publikováno v:
Thin Solid Films. 428:263-268
TiO 2 -doped HfO 2 thin films, as potential replacements for SiO 2 as high- k gate dielectric material, have been grown by photo-induced CVD using 222 nm excimer lamps at a temperature of 400 °C. Vaporised titanium isopropoxide and hafnium (IV) tetr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b130f77074853034aed9a3ac06a2b9c8
https://doi.org/10.1016/s0040-6090(02)01221-x
https://doi.org/10.1016/s0040-6090(02)01221-x
Autor:
S. Donet, Z. Saltyte, Carmen Jiménez, U. Miller, Georg Wahl, Dietmar Selbmann, A. Teiserskis, François Weiss, Patrick Chaudouët, Adulfas Abrutis, Jörg Eickemeyer, J.P. Sénateur, O StadeI
Publikováno v:
Physica C: Superconductivity. :652-655
Biaxially textured buffer layers and YBa 2 Cu 3 O 7 (YBCO) films were grown on NiO/Ni based substrates by pulsed injection MOCVD. High quality biaxially textured NiO layers have been prepared following an optimised recrystallisation–oxidation proce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07a8495fad0fdb557f7d19362b1a609e
https://doi.org/10.1016/s0921-4534(02)00822-5
https://doi.org/10.1016/s0921-4534(02)00822-5
Publikováno v:
Journal of Non-Crystalline Solids. 303:134-138
We report the deposition of thin titanium dioxide films on Si(1 0 0) and silica glass at low temperatures between 200 and 350 °C by a technique of ultraviolet-assisted injection liquid source chemical vapor deposition (UVILS-CVD) with 222 nm radiati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b6f18e40f0946b0b9883fdb42ed6d12b
https://doi.org/10.1016/s0022-3093(02)00973-0
https://doi.org/10.1016/s0022-3093(02)00973-0
Autor:
Zhongping Wang, J.-Y. Zhang, Q. Fang, J.P. Sénateur, Barry O'Sullivan, Ian W. Boyd, J.X. Wu, Paul K. Hurley, M.A. Audier, T.L. Leedham
Publikováno v:
Le Journal de Physique IV. 11:Pr11-301
We report the use of UV lamp sources, providing high photon fluxes over large-areas, to initiate the photo-deposition of ultrathin tantalum pentoxide (Ta 2 O 5 ) films with physical thickness between 4-10 nm at low temperatures (below 350°C). The ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f47c01158ad96a7739bef58ebe1e58b
https://doi.org/10.1051/jp4:20011149
https://doi.org/10.1051/jp4:20011149
Autor:
Timothy J. Leedham, Eamon O'Connor, Q. Fang, J.-Y. Zhang, Hywel O. Davies, Barry O'Sullivan, Never Kaliwoh, Catherine Dubourdieu, Paul K. Hurley, B. Semmache, Ian W. Boyd, Marc Audier, Anthony C. Jones, J.P. Sénateur, R Howley
Publikováno v:
Le Journal de Physique IV. 11:Pr11-261
An in situ low temperature chemical vapour deposition (CVD) system, featuring surface nitridation, dielectric layer deposition and post deposition anneal is presented. Processing is performed under the influence of ultra-violet radiation. After a ran
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cd4cf430c3ebdc2c345015372e22558
https://doi.org/10.1051/jp4:20011142
https://doi.org/10.1051/jp4:20011142
Autor:
Oliver Stadel, U. Miller, Georg Wahl, D. Selbmann, J. Eickemeyer, A. Teiserskis, S. Donet, J.P. Sénateur, Z. Saltyte, Carmen Jiménez, Patrick Chaudouët, François Weiss, A. Abrutis
Publikováno v:
Scopus-Elsevier
Biaxially textured YBa 2 Cu 3 O 7 (YBCO) thin films, yttria stabilized zirconia (YSZ) and yttria (Y 2 O 3 ), CeO 2 buffer layers were grown in situ on NiO/Ni based substrates by Pulsed Injection MOCVD (PICVD) using monoglyme solutions of β-diketonat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13ce46e53168413faa5e20dda46d7448
https://doi.org/10.1051/jp4:20011152
https://doi.org/10.1051/jp4:20011152
Publikováno v:
Le Journal de Physique IV. 11:Pr11-247
A thin film of lacunar lanthanum manganites La 0.8 MnO 3-δ has been epitaxially grown by injection chemical vapour deposition on a MgO (100) substrate. Transmission electronic microscopy and X-ray diffraction measurements were carried out on films b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c169effebc262ef19a6237fb9a3ab488
https://doi.org/10.1051/jp4:20011140
https://doi.org/10.1051/jp4:20011140
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2001, 391 (1), pp.21--27. ⟨10.1016/S0040-6090(01)00970-1⟩
Thin Solid Films, Elsevier, 2001, 391 (1), pp.21--27. ⟨10.1016/S0040-6090(01)00970-1⟩
International audience; A new metal-organic chemical vapour deposition (MOCVD) technique was used for fabrication of epitaxial La-manganite thin films La1-xMnO3-delta with both lanthanum and oxygen deficiencies. Three kinds of substrates, i.e. SrTiO3
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6096f00272d622c42e1cbf8ef3692ffe
https://doi.org/10.1016/s0040-6090(01)00970-1
https://doi.org/10.1016/s0040-6090(01)00970-1