Zobrazeno 1 - 10
of 36
pro vyhledávání: '"J.E. Leiss"'
Publikováno v:
IEEE Journal of Solid-State Circuits. 17:337-344
The TI dRAM cell, a MOSFET with two dynamically programmable threshold states, is very attractive for VLSI dRAM's because of its potential 3X density advantage over the one-transistor and -capacitor (1-T) cell, 10X lower leakage at high temperatures
Autor:
J.E. Leiss, R.A. Schrack
Publikováno v:
Reviews of Modern Physics. 30:456-461
An experiment was performed to determine nuclear radii from the coherent neutral meson production. Since the pi /sup 0/ production from neutrons and protons is essentially the same, what is measured is the distribution of nuclear matter as distinct f
Autor:
J.E. Leiss, S. Penner
Publikováno v:
Physical Review. 114:1101-1109
Publikováno v:
Physical Review. 107:1544-1548
Approximate range straggling curves for the slowing down of high-energy electrons in carbon have been calculated by a Monte Carlo technique using the University of Illinois digital computer. The effects of ionization straggling, radiation, and multip
Autor:
R.A. Schrack, J.E. Leiss
Publikováno v:
Physical Review. 109:1326-1328
A search has been made for an asymmetry in the decay photons from photoproduced neutral pions around the direction of motion of thc pions. No asymmetry was found. This indicatcs that if the pions should have nonzero spin, they are not polarized or al
Autor:
Pallab K. Chatterjee, J.E. Leiss
Publikováno v:
1980 International Electron Devices Meeting.
An analytic-predictor model which describes phenomena observed in small geometry MOSFETs is presented. I-V characteristics from subthreshold through saturation are predicted within the bounds of process parameter variations using only physical and st
Autor:
Louis C. Parrillo, J.E. Leiss, V.W. Soorholtz, R.W. Mauntel, Norm Herr, R.I. Kung, M.D. Bader, S.J. Cosentino, S.K. Madan, K.L. Wang, Horacio Mendez
Publikováno v:
1986 International Electron Devices Meeting.
A selectively pumped p-well SRAM cell technology is discussed. This technology allows the optimization of circuit speed while reducing the array leakage. In addition, a pumped p-well cell technology improves cell stability, reduces bit line capacitan
Autor:
T.D. Bonifield, Satwinder Malhi, D.E. Carter, D.J. Coleman, Pallab K. Chatterjee, R.F. Pinizzotto, J.E. Leiss
Publikováno v:
IEEE Electron Device Letters. 5:428-429
A novel device structure for self-aligning the overlaid device in a stacked CMOS process is introduced and demonstrated. The structure allows submicrometer channel length devices to be fabricated without using advanced lithographic technology. The se
Publikováno v:
Physical Review. 98:201-202
Autor:
J.E. Leiss, P.K. Chatterjee
Publikováno v:
IEEE Transactions on Electron Devices. 29:1694-1694