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pro vyhledávání: '"J.E. Castle"'
Akademický článek
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Autor:
J.E. Castle
The widespread use of X-ray photoelectron spectroscopy for the chemical analysis of very thin films on metal surfaces dates from 1970, and its development into a standard laboratory technique is briefly reviewed. Oxide films, both native and passive,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75698795746ee95f57e2fcf2f0f9828d
https://doi.org/10.1016/b978-0-12-409547-2.13837-5
https://doi.org/10.1016/b978-0-12-409547-2.13837-5
Autor:
J.E. Castle, S.M. Newstead, John F. Watts, H.D. Liu, Terry E. Whall, P.L.F. Hemment, R. A. Kubiak, Evan H. C. Parker, J.P. Zhang
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 96:281-285
The thermal stability of GeO2 formed by oxygen implantation into Si0.5Ge0.5 alloy has been investigated and quantified. The sample used in this experiment consisted of a 900 nm relaxed layer of Si0.5Ge0.5 alloy capped with 78 nm of silicon which was
Akademický článek
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Autor:
H.D. Liu, J.P. Zhang, P.L.F. Hemment, S.M. Newstead, A.R. Powell, Evan H. C. Parker, J.E. Castle, Terry E. Whall, John F. Watts
Publikováno v:
Materials Science and Engineering: B. 12:199-203
A Si0.5Ge0.5 alloy layer was implanted at a temperature of about 500 °C with doses of 0.6 × 1018, 1.2 × 1018 and 1.8 × 1018 O+ cm−2 at an energy of 200 keV. The alloy layer was prepared by molecular beam expitaxy (MBE), with an 800 nm thick fil
Autor:
Evan H. C. Parker, J.E. Castle, J.P. Zhang, A.R. Powell, A.K. Robinson, John F. Watts, H.D. Liu, U. Bussmam, S.M. Newstead, P.L.F. Hemment, Terry E. Whall
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 55:691-696
The effects of high dose O+ implantation into a Si0.5Ge0.5 alloy, studied by Rutherford backscattering, infrared spectrophoiometry and X-ray photoelectron spectroscopy, are reported for the first time. The alloy layers were prepared by molecular beam
Autor:
A.K. Robinson, John F. Watts, J.E. Castle, J.P. Zhang, U. Bussmann, H.D. Liu, Terry E. Whall, A.R. Powell, P.L.F. Hemment, Evan H. C. Parker, S.M. Newstead
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 55:697-700
An attempt to implant a high dose (up to 1.8 × 1018 cm−2) O+ ions into a Si0.5Ge0.5 alloy grown by molecular beam epitaxy (MBE) was made in this work, and the oxidation of the alloy by the implantation before and after thermal treatment was studie
Autor:
Terry E. Whall, Hengda Liu, B.J. Sealy, J.E. Castle, Y.S. Tang, J.P. Zhang, Evan H. C. Parker, S.M. Newstead, P.L.F. Hemment, A.R. Powell
Publikováno v:
Journal of Applied Physics. 67:7151-7153
The formation of buried SiO2 layer by high‐dose oxygen implanted into Si/Ge and Si/Si0.5Ge0.5 heterostructures is studied by infrared transmission and x‐ray photoelectron spectroscopy. The results show that the Ge in the implanted region has no i
Akademický článek
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Autor:
M.R Hunt, J.E Castle
Publikováno v:
Corrosion Science. 16:137-144
Modification of the scanning electron microscope (SEM) to include a heated stage, facilities for gas flow whilst viewing and time-lapse cinephotography is described. The use of the technique is illustrated by the oxidation of mild steel and single-cr