Zobrazeno 1 - 10
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pro vyhledávání: '"J.A. van Kan"'
Akademický článek
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Akademický článek
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Autor:
Frank Watt, J.A. van Kan, Minqin Ren, Zhaohong Mi, Andrew A. Bettiol, Thomas Walczyk, X Ji, A. Hoi, Thomas Osipowicz, Saumitra K. Vajandar
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 406:15-24
At the Centre for Ion Beam Applications (CIBA), a 3.5 MV HVEE Singletron™ accelerator serves to provide MeV ion beams (mostly protons or He + ) to six state-of-the-art beam lines, four of which are equipped with Oxford triplet magnetic quadrupole l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eb55606a46e385d9bbb0aad824a00c1d
https://doi.org/10.1016/j.nimb.2017.01.004
https://doi.org/10.1016/j.nimb.2017.01.004
Autor:
H. D. Liang, Thirumalai Venkatesan, Zhiya Dang, M. B. H. Breese, J.A. van Kan, A. Maira, M.D. Ynsa, Jianfeng Wu, Vicente Torres-Costa, Sarfraz Qureshi
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 394:1-5
We have developed a micromachining process to produce high-aspect-ratio channels and holes in glass and porous silicon. Our process utilizes MeV proton beam irradiation of silicon using direct writing with a focused beam, followed by electrochemical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b3b4740de34ea3e06e61234eb721c6d
https://doi.org/10.1016/j.nimb.2016.12.025
https://doi.org/10.1016/j.nimb.2016.12.025
Akademický článek
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Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 348:229-232
Nanoimprint lithography (NIL) is a promising technology that can fabricate structures with high resolution and high throughput. To replicate patterns through NIL, a high quality master mold is needed. A UV patternable inorganic–organic hybrid polym
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34cfcd5f5e221a2a310948888b1ec373
https://doi.org/10.1016/j.nimb.2015.01.067
https://doi.org/10.1016/j.nimb.2015.01.067
Autor:
Y. Yao, J.A. van Kan
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 348:203-208
Proton beam writing (PBW) has the ability to fabricate high aspect ratio 3D micro/nano-structures with precise edges, smooth and straight side-walls. The newly developed 2nd generation PBW line has a high lens demagnification and is equipped with a s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::551b4f914d74209777aa8760c15c1c8c
https://doi.org/10.1016/j.nimb.2014.12.066
https://doi.org/10.1016/j.nimb.2014.12.066
Publikováno v:
Applied Surface Science. 310:100-111
Proton beam writing (PBW) is a lithographic technique that has been developed since the mid 1990s, initially in Singapore followed by several groups around the world. MeV protons while penetrating materials will maintain a practically straight path.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de0c7e574acee1ae08b0f58e85b64a42
https://doi.org/10.1016/j.apsusc.2014.04.147
https://doi.org/10.1016/j.apsusc.2014.04.147
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 306:6-11
MeV proton and alpha (helium ion) particle beams can now be focused to 20 nm spot sizes, and ion/matter simulations using the DEEP computer code show that these resolutions are maintained through the top micrometre or so of organic material. In addit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e88a2c4ef4030604d2f09c2fce32ef43
https://doi.org/10.1016/j.nimb.2012.11.047
https://doi.org/10.1016/j.nimb.2012.11.047
Publikováno v:
Microelectronic Engineering. 102:40-43
In our experiments, we use different photoresists for proton beam writing and mold fabrication. We have fabricated Ni mold with structures down to 500nm. We first use a fine focused proton beam to expose different photoresists, Polymethyl Methacrylat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d6cc77f5b3344ed62fc5608a9c9e5059
https://doi.org/10.1016/j.mee.2012.05.003
https://doi.org/10.1016/j.mee.2012.05.003