Modular EUV Source for the Next Generation Lithography

Autor: Didier Normand, J. Skrzypczak, Thierry Auguste, P. Cormont, Guy Cheymol, F. Beaumont, J.-F. Hergott, S. Muller, Benoit Barthod, M. Rosset-Kos, I. Gaurand, M. Davenet, P.-Y. Thro, R. Bernard, O. Sublemontier, J.-M. Le Caro, Martin Schmidt, E. Marquis, D. Farcage, P. Mauchien, Tiberio Ceccotti

Publikováno v: Journal of Laser Micro/Nanoengineering
Journal of Laser Micro/Nanoengineering, Japan Laser Processing Society, 2011, 6 (2), pp.113-118. ⟨10.2961/jlmn.2011.02.0004⟩
11th International Symposium on Laser Precision Microfabrication
11th International Symposium on Laser Precision Microfabrication, Jun 2010, Stuttgart, Germany. pp.113-118, ⟨10.2961/jlmn.2011.02.0004⟩
Journal of Laser Micro/Nanoengineering, 2011, 6 (2), pp.113-118. ⟨10.2961/jlmn.2011.02.0004⟩

International audience; The present work, performed in the frame of the EXULITE project, was dedicated to the design and characterization of a laser-plasma-produced extreme ultraviolet (EUV) source prototype at 13.5 nm for the next generation lithogr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::94d8367afc59a044617e35cf77ad2987
https://hal.archives-ouvertes.fr/hal-00658816