Zobrazeno 1 - 10
of 98
pro vyhledávání: '"J.-H. Fock"'
Publikováno v:
Addicta: The Turkish Journal on Addictions. Aug2024, Vol. 11 Issue 2, p226-232. 7p.
Autor:
H. Pohlmann, M. Dumling, W. Schnitt, Antoon M. H. Tombeur, Henricus G. R. Maas, J.-H. Fock, J.R. Haartsen, Ronald Dekker, Theodorus Martinus Michielsen
Publikováno v:
2006 Bipolar/BiCMOS Circuits and Technology Meeting.
A simple and robust technology for the transfer of circuits, processed on normal silicon wafers, to alternative substrates is presented. Substrate transfer technology (STT) is a post-processing technology based on adhesive bonding using a UV curing a
Autor:
Theodorus Martinus Michielsen, J.-H. Fock, M. Dumling, W. Schnitt, C. Jonville, Antoon M. H. Tombeur, H. Pohlmann, Ronald Dekker, O. Gourhant
Publikováno v:
Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting, 2005..
In CIRCONFLEX technology, circuits fabricated on SOI wafers are transferred to a 10 /spl mu/m thick polyimide carrier. The highly flexible circuits remain defect free even after bending to radii of less than 1 mm, making them attractive for chip-in-p
Autor:
Ronald Dekker, J.-H. Fock, P. Mijlemans, H. Pohlmann, K. Dessein, C. Jonville, A.M.H. Tombeur, A. Gakis, Cornelis Eustatius Timmering, W. Schnitt, Theodorus Martinus Michielsen, O.M. Kuijken
Publikováno v:
IEEE International Electron Devices Meeting 2003.
Substrate transfer is proposed as a wafer-scale postprocessing technology to transfer circuits processed with standard IC processing to an alternative substrate e.g. glass. The advantages of the complete elimination of RF coupling to the resistive si
Autor:
J. -H. Fock, H. Fehling
Publikováno v:
Prozeßtechnologie ISBN: 9783540176701
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66a6ca9bbfa13ffb4d42e7e48d7f3409
https://doi.org/10.1007/978-3-662-09540-9_4
https://doi.org/10.1007/978-3-662-09540-9_4
Autor:
J.-H. Fock, E.E. Koch
Publikováno v:
Chemical Physics. 96:125-143
Photoelectron energy distribution curves from solid films of SF 6 and CCl 4 have been measured in the photon energy range 10 ⩽ hr ⩽ 40 eV using synchrotron radiation. The binding energies, peak widths and relative partial cross sections have been
Publikováno v:
Journal of Electron Spectroscopy and Related Phenomena. 34:225-234
The electronic structure of the valence bands of polycrystalline films of pyridine (C 5 H 5 N), including all valence levels extending from initial energies of 4 down to 30 eV ( E VAC = 0), has been determined from photoelectron energy distribution m
Publikováno v:
Solid State Communications. 42:897-901
Surface induced local d-band states in the upper 4d band between ∼ 4 and ∼ 5.2 eV below EFermi have been identified for polycrystalline silver films in photoemission experiments using synchroton radiation. A thin over-coat (10 a) by an Al film le
Publikováno v:
Chemical Physics Letters. 89:281-286
Photoelectron energy distribution curves from solid nitrogen were measured for excitation energies to 40 cV using synchrotron radiation. Partial cross sections for emission from 3σ g , 1π u and 2σ u derived valence bands show pronounced mauna 3, 4
Autor:
E.E. Koch, J.-H. Fock
Publikováno v:
Chemical Physics Letters. 105:38-43
Photoelectron energy distribution curves from solid acetylene were measured for excitation energies up to 30 eV using synchrotron radiation. The partial cross sections are discussed in relation to theory and other experiments. The 1π u valence-band