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Autor:
J. W.D. Martens, Judon M. D. Stoeldraijer, Stefan Wittekoek, H. F. D. Linders, Douglas R. Ritchie, Martin A. van den Brink
Publikováno v:
Optical/Laser Microlithography III.
A new excimer laser stepper at 248 nm wavelength Is described wilti an all quartz 5x reduction lens with NA 0. 42 and 21 . 2 mm field size. Design aspects and experimental data are reported. A key feature of the system is a ilL alignment system with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc974492f47bfa3bc059b26f11542c2d
https://doi.org/10.1117/12.20207
https://doi.org/10.1117/12.20207
