Zobrazeno 1 - 5
of 5
pro vyhledávání: '"J. W. Irving"'
Autor:
Brian Fletcher, Whitney Longsine, Tim Stachowiak, J. W. Irving, Niyaz Khusnatdinov, Weijun Liu, Wei Zhang, Zhengmao Ye, Matthew C. Traub
Publikováno v:
SPIE Proceedings.
Imprint lithography is a promising technology for replication of nano-scale features. For semiconductor device applications, Canon deposits a low viscosity resist on a field by field basis using jetting technology. A patterned mask is lowered into th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee1ccb98993bd98d6ceecd5514187168
https://doi.org/10.1117/12.2260466
https://doi.org/10.1117/12.2260466
Autor:
Brian Fletcher, Van N. Truskett, Niyaz Khusnatdinov, Whitney Longsine, Wei Zhang, Tim Stachowiak, Dwayne L. LaBrake, Ecron Thompson, Zhengmao Ye, J. W. Irving, Weijun Liu, Matthew C. Traub
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5712d3283ebb51563e1bc1bb2f09484c
https://doi.org/10.1117/12.2219161
https://doi.org/10.1117/12.2219161
Autor:
Yukio Takabayashi, Keiji Emoto, Kiyohito Yamamoto, Hisanobu Azuma, Hitoshi Nakano, Ali Aghili, Chiaki Sato, Christopher Michael Jones, Tadashi Hattori, Tsuneo Takabayashi, Fumio Sakai, Zhengmao Ye, Brian Fletcher, Jin Choi, Yoshio Kawanobe, Toshiaki Ando, Mitsuru Hiura, J. W. Irving, Takehiko Iwanaga
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f22e63fb4bc8a01ea04ee3effe0b709
https://doi.org/10.1117/12.2219036
https://doi.org/10.1117/12.2219036
Autor:
Whitney Longsine, Dwayne L. LaBrake, Sidlgata V. Sreenivasan, Luo Kang, Niyaz Khusnatdinov, Weijun Liu, Brian Fletcher, J. W. Irving, Van N. Truskett, Frank Y. Xu, Matthew S. Shafran, Tim Stachowiak, Zhengmao Ye, Matthew C. Traub, Xiaoming Lu
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography (J-FIL) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4140a301356c6b1f46c4b10a865bdba
https://doi.org/10.1117/12.2048189
https://doi.org/10.1117/12.2048189
Autor:
Matthew S. Shafran, Whitney Longsine, Wei Zhang, J. W. Irving, Saul Lee, Weijun Liu, Brian Fletcher, Van N. Truskett, Luo Kang, Douglas J. Resnick, Xiaoming Lu, Sidlgata V. Sreenivasan, Zhengmao Ye, Frank Y. Xu, Dwayne L. LaBrake
Publikováno v:
Alternative Lithographic Technologies V.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography (J-FIL) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e750e50fd1ef6de9e605c2c80bdda2ae
https://doi.org/10.1117/12.2013694
https://doi.org/10.1117/12.2013694