Zobrazeno 1 - 10 of 222 pro vyhledávání: '"J. W. Coburn"'
1
Comparison of model and experiment for Ar, Ar/O2and Ar/O2/Cl2inductively coupled plasmas
Autor: Cheng-Che Hsu, David B. Graves, J. W. Coburn, Mark A Nierode
Publikováno v: Journal of Physics D: Applied Physics. 39:3272-3284
Comparisons of fluid model predictions with various measurements in an inductively coupled plasma are reported. The gas chemistries used include pure Ar, mixtures of Ar and O2 and mixtures of Ar, O2 and Cl2 for pressures ranging from 10 to 80 mTorr a
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3128a49c8798fc08e6ac9369f1bef4ee
https://doi.org/10.1088/0022-3727/39/15/009
Zobrazit plný text záznamu
2
Etching of ruthenium coatings in O2- and Cl2-containing plasmas
Autor: David B. Graves, C. C. Hsu, J. W. Coburn
Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 24:1-8
Ruthenium (Ru) film etching has been studied with O2- and Cl2-containing inductively coupled plasmas to understand the etching mechanism and the relationship between plasma characteristics and the competition between the wall deposition of etch by-pr
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b599c78df557bb6e715080734feade1d
https://doi.org/10.1116/1.2121751
Zobrazit plný text záznamu
3
Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO2 surfaces
Autor: Yoshie Kimura, David B. Graves, J. W. Coburn
Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:2508-2516
Si and SiO2 were exposed to c-C4F8 with and without Ar+, and to a mixture of characterized CxFy radical and stable species with and without Ar+. The mixture of CxFy radical and stable species was created from c-C4F8 and Ar plasma and included CF, CF2
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9291aa024f3a9f1d84d8fbd7fb445aa5
https://doi.org/10.1116/1.1810166
Zobrazit plný text záznamu
4
Plasma–surface interactions
Autor: J. W. Coburn, Jeffrey Chang
Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 21:S145-S151
Over the past decades, our understanding of the fundamental processes occurring in the plasma and at plasma–material interfaces has evolved from being macroscopic and phenomenological to microscopic and mechanistic. This article aims to provide an
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::19ee458dd07028665fa27dabb98a87c8
https://doi.org/10.1116/1.1600452
Zobrazit plný text záznamu
5
C4F8 dissociation in an inductively coupled plasma
Autor: David B. Graves, M. T. Radtke, J. W. Coburn
Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 21:1038-1047
A study of the dissociation of a small concentration of cyclic-C4F8 (c-C4F8) in a predominately argon, low pressure inductively coupled plasma is reported. Measurements of electron density, plasma potential, and electron energy distribution function
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::21ba0f82a8c368dcc79c067b85323b49
https://doi.org/10.1116/1.1582456
Zobrazit plný text záznamu
6
Fundamental beam studies of radical enhanced atomic layer deposition of TiN
Autor: David B. Graves, D. Fraser, Frank Greer, J. W. Coburn
Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 21:96-105
TiN films were deposited using radical enhanced atomic layer deposition (REALD) in an ultrahigh vacuum beam system. The REALD cycle used for the film deposition consisted of separate, sequential exposures of TiCl4, deuterium atoms, and nitrogen atoms
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ea5856c4722edac8a32248dcb7f4cd88
https://doi.org/10.1116/1.1524145
Zobrazit plný text záznamu
8
Measurements of neutral and ion composition, neutral temperature, and electron energy distribution function in a CF4 inductively coupled plasma
Autor: Harmeet Singh, J. W. Coburn, David B. Graves
Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:718-729
In this article, we present comprehensive measurements of the neutral number densities, ion number densities, and the electron energy distribution function in a CF4 inductively coupled plasma at pressures between 1 and 30 mTorr, and deposited powers
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4207d819b981c6ab831b02c185370fea
https://doi.org/10.1116/1.1354603
Zobrazit plný text záznamu
9
Surface loss coefficients of CFx and F radicals on stainless steel
Autor: Harmeet Singh, David B. Graves, J. W. Coburn
Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:2680-2684
The surface loss coefficients of CFx (x=1–3) and F radicals have been measured on the stainless steel walls of the differential pumping systems of a plasma reactor. This measurement is made by comparing the beam to background signal ratio of the ra
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b263335bd7ca3e3880b53d46fc583121
https://doi.org/10.1116/1.1308585
Zobrazit plný text záznamu
10
Recombination coefficients of O and N radicals on stainless steel
Autor: David B. Graves, Harmeet Singh, J. W. Coburn
Publikováno v: Journal of Applied Physics. 88:3748-3755
Surface recombination coefficients of O and N radicals in pure O2 and N2 plasmas, respectively, have been estimated on the stainless steel walls of a low-pressure inductively coupled plasma reactor. The recombination coefficients are estimated using
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::277217f2fc3d887345bc8b2185c219c1
https://doi.org/10.1063/1.1289046
Zobrazit plný text záznamu

Vyhledávací nástroje:

Upřesnit hledání

Omezení vyhledávání
Plný text Recenzováno Digitální knihovna AV ČR
Zdroje