Zobrazeno 1 - 10
of 19
pro vyhledávání: '"J. W. Bartha"'
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 24:338-347
Chemical mechanical planarization (CMP) models which are able to make predictions for a full chip are highly desirable in semiconductor manufacturing. Previous models proposed to this end have largely focused on effects of pattern density. We here ex
Publikováno v:
Thin Solid Films. 515:1612-1617
Flexible thin-film solar cells require flexible encapsulation to protect the copper–indium–2 selenide (CIS) absorber layer from humidity and aggressive environmental influences. Tantalum–silicon-based diffusion barriers are currently a favorite
Publikováno v:
SPIE Proceedings.
The plasma enhanced chemical vapor deposition technology (PECVD) is one of the commonly used deposition techniques for amorphous and microcrystalline silicon thin film and solar cell fabrication. The VHF-PECVD process developed at Dresden University
Publikováno v:
2011 Semiconductor Conference Dresden.
Atomic layer deposition (ALD) is the most advanced technique for the fabrication of ultra-thin conformal films. To yield high quality films, the knowledge of chemical reactions and interactions between the substrate surface and the precursors is beco
In this paper, we consider the chemical-mechanical planarization (CMP) of adjacent line-space structures with different pattern density. Such structures are used on test-chips for process characterization and provide similar features like typical DRA
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8498440a093704494440d1f2f4246a5a
https://publica.fraunhofer.de/handle/publica/225378
https://publica.fraunhofer.de/handle/publica/225378
Publikováno v:
26th International Spring Seminar on Electronics Technology: Integrated Management of Electronic Materials Production, 2003..
One approach to reestablish disabled functions or to treat chronic diseases of patients is the electrical stimulation of nerves. This requires, in addition to special stimulator electronics, a dedicated electrode in close contact with the specific ne
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 29:06FC16
In this work, the authors developed reactive-ion etching processes to fabricate silicon templates with smooth tapered sidewalls for nanoimprint lithography. In these etching processes a dual-layer etching mask system was used to avoid the mask underc
Autor:
Martin Henzler, J. W. Bartha
Publikováno v:
Surface Science. 160:379-386
The epitaxial growth up to 20 monolayers of Xe on the Si(111) 7×7 surface at several temperatures between 25 and 50 K has been studied by LEED. A variety of different LEED patterns demonstrate that there is a significant influence of the silicon str
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 3:1588-1591
The binding energy of noble gases depends on the arrangement of atoms close to the adatom. Due to the weak forces of physisorption a rearrangement of the substrate during adsorption is unlikely. Therefore, the desorption of noble gases reveals the lo
Publikováno v:
Journal of Physics C: Solid State Physics. 19:2459-2467
The authors studied the adsorption-desorption behaviour of Ar and Xe on the Si(111) 7*7 reconstructed surface. Using thermal desorption spectroscopy (TDS) one can clearly distinguish between adsorption in the monolayer range and higher coverage. Deso